Publications 2010

31 bis 40 von 65 Einträgen

Starke, E.; Marschner, U.; Pfeifer, G.; Fischer, W.-J.; Flatau, A.B.: Influence of a nonuniform stress on the electromechanical transduction coefficient of a magnetostrictive unimorph. In: SOIE Conf. 7644, Behavior and Mechanics of Multifunctional Materials and Composites 2010, 7-11 March, San Diego, USA (2010)

Graham, F.; Mudivarthi, C.; Yoo, J.; Marschner, U.; Neubert, H.; Flatau, A.B.: FEM-simulation-based characterization of a magnetostrictive gyro sensor. In: Proc. 11th Joint MMM-Intermag Conf., 18-22 January 2010, Washington, DC, USA J. Appl. Phys. 107, 09E705 (2010)

Marschner, U.; Starke, E.; Pfeifer, G.; Fischer, W.-J.; Flatau, A.B.: Models for optimizing magnetoelastic thin film planar coil sensor design. In: Proc. 11th Joint MMM-Intermag Conf., 18-22 January 2010, Washington, DC, USA (2010)

Strehle, S.; Menzel, S.; Bartha, J.W.; Wetzig, K.: Electroplating of Cu(Ag) thin films for interconnect applications. In: Microelectronic Engineering 87 (2010), S. 180–186

Rose, M.; Niinistö, J.; Endler, I.; Bartha, J.W.; Kücher, P.; Ritala, M.: In Situ Reaction Mechanism Studies on Ozone-Based Atomic Layer Deposition of Al2O3 and HfO2. In: Applied Materials & Interfaces 256 (2010), Nr. 2, S. 347–350

Rose, M.; Bartha, J.W.; Endler, I.: Temperature dependence of the sticking coefficient in atomic layer deposition. In: Applied Surface Science 256 (2010), S. 3778–3782

Neuner, J.; Zienert, I.; Peeva, A.; Preusse, A.; Kücher, P.; Bartha, J.W.: Microstructure in copper interconnects - Influence of plating additive concentration. In: Microelectronic Engineering 87 (2010), S. 254–257

Ostermay, I.; Kammler, T.; Bartha, J.W.; Kücher, P.: Enhancing epitaxial SixC1_x deposition by adding Ge. In: Thin Solid Films 518 (2010), S. 2834–2838

Knaut, M.; Geidel, M.; Krause, M.; Albert, M.; Bartha, J.W.: Ultra-thin AlxTi1-xOy films deposited by atomic layer deposition for DRAM capacitors and quantum devices. In: Proceeding of Nanofair Conference 2010, Dresden, Germany (2010)

Junige, M.; Knaut, M.; Geidel, M.; Albert, M.; Bartha, J.W.: In-situ characterization of ruthenium and ruthenium dioxide film growth. In: Proceeding of Baltic ALD / GerALD Conference 2010, Hamburg, Germany (2010)

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Dr. Steffen Strehle
Last modified: Sep 14, 2016