Published Journals 2008

1 bis 10 von 10 Einträgen

Knaut, M.; Albert, M.; Bartha, J.W.; Schmidt, D.; Schumacher, H.; Strehle, S.: Effect of wet chemical substrate pretreatment on the growth behavior of Ta(N) films deposited by thermal ALD. In: Microelectronic Engineering 85 (2008), S. 2064–2067

Richter, A.; Paschew, G.; Klatt, S.; Lienig, J.; Arndt, K.-F.; Adler, H.-J.: Review on hydrogel-based pH sensors and microsensors. In: Sensor 8 (2008), S. 561–581

Naumann, A.; Kronholz, S.; Mowry, A.; Ostermay, I. ; Bierstedt, H. ; Trui, B.; Dittmar, K.; Kuecher, P.; Bartha, J.W.; Kammler, T.: Novel anhanced stressors with graded encapsulated SiGe embedded in the source and drain areas. In: Materials Science and Engineering B 154-155 (2008), S. 95–97

Ostermay, I.; Kammler, T.; Naumann, A.; Bartha, J.W.; Kuecher, P.: Investigation of the relaxation behavior of Si1-xCx alloys during epitaxal UHV-CVD growth. In: Materials Science and Engineering B 154-155 (2008), S. 90–94

Richter, A.; Paschew, G.: Optoelectrothermic control of polymer-based highly integrated MEMS applied in an artificial skin. In: Adv. Mater DOI: 10.1002/adma.200802737 (2008)

Scholles, M.; Bräuer, A.; Frommhagen, K.; Gerwig, C.; Lakner, H.; Schenk, H.; Schwarzenberg, M.: Ultra compact laser projection systems based on two-dimensional resonant micro scanning mirrors . In: Journal of Micro/Nanolithography, MEMS and MOEMS 7 (2) (2008), S. 021001–1–021001–11

Guillen, S.; Duzynski, M.; Nauber, P.; Schelinski, U.; Scholles, M.: Novel Bridge for Networking IEEE 1394 Clusters via UWB over Coaxial Cable for HANA & AV/C Digital Multimedia Networks. In: IEEE Transactions on Consumer Electronics 54 (2008), S. 507–512

Dang, X.-D.; Plötner, Matthias; Richter, Stefan; Fischer, Wolf-Joachim: Aluminum oxide film as gate dielectric for organic FETs:Anodization and characterization. In: Phys. Stat. Sol. (a) 205 (2008), S. 662–632

Albert, M.; Bartha, J.W.: Atomlagenabscheidung als Werkzeug für die Nanotechnologie. In: Vakuum in der Forschung und Praxis 20(2008)1 (2008), S. 7–10

Schmidt, D.; Strehle, S.; Albert, M.; Hentsch, W.; Bartha, J.W.: Top Injection Reactor Tool with in situ Spectroscopic Ellipsometry for growth and characterization of ALD thin films. In: Microelectronic Engineering 85 (2008), S. 527–533

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Philipp Wenskus
Last modified: Sep 22, 2016