Published Journals 2010 1 bis 10 von 23 EinträgenPaschew, G.; Richter, A.: High-resolution tactile display operated by an integrated 'Smart Hydrogel' actuator array. In: Proc. SPIE 7642, Electroactive Polymer Actuators and Devices (EAPAD) 2010, 764234 (April 09, 2010) (2010)Marschner, U.; Starke, E.; Pfeifer, G.; Fischer, W.-J.; Flatau, A.B.: Electromagnetic network models of planar coils on a thick or thin magnetic layer. In: IEEE Transactions on Magnetics 46 (2010), Nr. 6, S. 2365–2368Türke, A.; Fischer, W.-J.; Adler, H.-J.; Pich, A.: Microwave-assisted synthesis of hybrid colloids for design of conducting films. In: Polymer 51 (2010), S. 4706–4712Lotin, A.A.; Novodvorsky, O.A.; Khaydukov, E.V.; Glebov, V.N.; Rocheva, V.V.; Khramova, O.D.; Panchenko, V.Ya.; Wenzel, C.; Trumpaicka, N.; Chtcherbachev, K.D.: Epitaxial growth and properties of MgxZn1-xO films produced by pulsed laser deposition. In: Semiconductors 44 (2010), Nr. 2, S. 246–250Лотин, A.A.; Новодворский, O.A.; Хайдуков, E.B.; Рочева, B.B.; Храмова, О.Д.; Панченко, В.Я.; Венцель, K.; Трумпайска, H.; Щербачев, К.Д.: Эпитаксиальный рост и свойства пленок MgxZn1-xO, получаемых методом лазерно-плазменного осаждения. In: Физика и Техника Полупроводников 44 (2010), Nr. 2, S. 260–264Graham, A.P.; Richter, K.; Jay, T.; Weber, W.; Knebel, S.; Schröder, U.; Mikolajick, T.: An investigation of the electrical properties of metal-insulator-silicon capacitors with pyrolytic carbon electrodes. In: Journal of Applied Physics 108, Issue 10, 104508 (2010) (2010)Seidl, K.; Knobbe, J.; Schneider, D.; Lakner, H.: Distortion correction of all-reflective unobscured optical-power zoom objective. In: Appl. Optics 49 (2010), Nr. 14, S. 2712–2719Gil, T.; May, C.; Scholz, S.; Franke, S.; Törker, M.; Lakner, H.; Leo, K.; Keller, S.: Origin of damages in OLED from Al top contact deposition using magnetron sputtering. In: Organic Electronics 11 (2010), S. 322–331Strehle, S.; Menzel, S.; Bartha, J.W.; Wetzig, K.: Electroplating of Cu(Ag) thin films for interconnect applications. In: Microelectronic Engineering 87 (2010), S. 180–186Rose, M.; Niinistö, J.; Endler, I.; Bartha, J.W.; Kücher, P.; Ritala, M.: In Situ Reaction Mechanism Studies on Ozone-Based Atomic Layer Deposition of Al2O3 and HfO2. In: Applied Materials & Interfaces 256 (2010), Nr. 2, S. 347–350 1 2 3 WeiterDiese Informationen werden vom Vorgängersystem FIS bereitgestellt.