Veröffentlichte Journale 2010 11 bis 20 von 23 EinträgenRose, M.; Bartha, J.W.; Endler, I.: Temperature dependence of the sticking coefficient in atomic layer deposition. In: Applied Surface Science 256 (2010), S. 3778–3782Neuner, J.; Zienert, I.; Peeva, A.; Preusse, A.; Kücher, P.; Bartha, J.W.: Microstructure in copper interconnects - Influence of plating additive concentration. In: Microelectronic Engineering 87 (2010), S. 254–257Ostermay, I.; Kammler, T.; Bartha, J.W.; Kücher, P.: Enhancing epitaxial SixC1_x deposition by adding Ge. In: Thin Solid Films 518 (2010), S. 2834–2838Zimmermann, T.; Strobel, C.; Albert, M.; Beyer, W.; Gordijn, A.; Flikweert, A.J.; Kuske, J.; Bartha, J.W.: Inline deposition of microcrystalline silicon solar cells using a linear plasma source. In: Phys. Status Solidi C 7 (2010), Nr. 3-4, S. 1097–1100Schmidt, D.; Knaut, M.; Hossbach, C.; Albert, M.; Hintze, B.; Dussarrat, C.; Bartha, J.W.: Atomic Layer Deposition of Ta-N-Based Thin Films Using a Tantalum Source. In: Journal of The Electrochemical Society 157 (2010), S. 638–642Roessler, T.; Gluch, J.; Albert, M.; Bartha, J.W.: Electrical characterisation of HfYO MIM-structures deposited by ALD. In: Thin Solid Films 518 (2010), S. 4680–4683Schumacher, H.; Künzelmann, U.; Vasilev, B.; Eichhorn, K.-J.; Bartha, J.W.: Applications of Microstructured Silicon Wafers as Internal Reflection Elements in Attenuated Total Reflection Fourier Transform Infrared Spectroscopy. In: Applied Spectroscopy 64 (2010), Nr. 9, S. 1022–1027Kubasch, C.; Klaus, C.; Ruelke, H.; Mayer, U.; Bartha, J.W.: Investigation of Moisture Uptake in Low-k Dielectric Materials. In: IEEE Transaction on Electron Devices 57 (2010), Nr. 8, S. 1865–1872Haubner, K.; Murawski, J.; Olk, P.; M., Lukas; Ziegler, C.; Adolphi, B.; Jaehne, E.: The Route to Functional Graphene Oxide. In: ChemPhysChem (2010)Adolphi, B.; McCord, J.; Bertram, M.; Oertel, C.-G.; Merkel, U.; Marschner, U.; Schäfer, R.; Wenzel, C.; Fischer, W.-J.: Improvement of Sputtered Galfenol Thin Films for Sensor Applications. In: Smart Mater. Struct. 19 (2010) 055013 (2010)Zurück 1 2 3 WeiterDiese Informationen werden vom Vorgängersystem FIS bereitgestellt.