Veröffentlichte Journale 11 bis 20 von 252 EinträgenJunige, M.; Löffler, M.; Geidel, M.; Albert, M.; Bartha, J.W.; Zschech, E.; Rellinghaus, B.; van Dorp, W.F.: Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2 substratum. In: Nanotechnology 28 (2017), Nr. 39 (2017), S. 395301Franke, M.; Slowik, I.; Mehner, P. J.; Paschew, G.; Voigt, A.; Fröb, H.; Leo, K.; Richter, A.: Electrically Tunable Dye Emission via Microcavity Integrated PDMS Gel Actuator. In: ACS Appl. Mater. Interfaces, 2017, 9 (34) (2017), S. 29193–29202Franke, M.; Leubner, S.; Dubavik, A.; George, A.; Savchenko, T.; Pini, C.; Frank, P.; Melnikau, D.; Rakovich, Y.; Gaponik, N.; Eychmüller, A.; Richter, A.: Immobilization of pH-sensitive CdTe Quantum Dots in a Poly(acrylate) Hydrogel for Microfluidic Applications. In: Nanoscale Research Letters (2017)Henke, T.; Knaut, M.; Geidel, M.; Winkler, F.; Albert, M.; Bartha, J.W.: Atomic layer deposition of tantalum oxide thin films using the precursor tert-butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film properties. In: Thin Solid Films 627 (2017), S. 94–105Patommel, J.; Klare, S.; Hoppe, R.; Ritter, S.; Samberg, D.; Wittwer, F.; Jahn, A.; Richter, K.; Wenzel, C.; Bartha, J.W.; Scholz, M.; Seiboth, F.; Boesenberg, U.; Falkenberg, G.; Schroer, C.G.: Focusing hard x rays beyond the critical angle of total reflection by adiabatically focusing lenses. In: Appl. Phys. Lett. 110, 101103 (2017)Schwille, M.; Barth, J.; Schössler, T.; Schön, F.; Bartha, J.W.; Oettel, M.: Simulation approach of Atomic Layer Deposition in large 3D structures. In: Modelling and Simulation in Materials Science and Engineering (2017)Schwille, C.; Schössler, T.; Schön, F.; Oettel, M.; Bartha, J.W.: Temperature dependence of the sticking coefficients of bis-diethyl aminosilane and trimethylaluminum in atomic layer deposition. In: J. Vac. Sci. Technol. A 35 , 01B119 (2017)Schwille, M. C.; Schössler, T.; Barth, J.; Knaut, M.; Schön, F.; Höchst, A.; Oettel, M.; Bartha, J.W.: Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures . In: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35, 01B118 (2017)Henke, T.; Knaut, M.; Hossbach, C.; Geidel, M.; Albert, M.; Bartha, J.W.: Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition . In: Surface & Coatings Technology 309 (2017), S. 600–608Köckritz, T.; Luther, R.; Paschew, G.; Jansen, I.; Richter, A.; Jost, O.; Schönecker, A.; Beyer, E.: Full Polymer Dielectric Elastomeric Actuators (DEA) Functionalised with Carbon Nanotubes and High-K Ceramics . In: Micromachines 2016, 7(10), 172 (2016)Zurück 1 2 3 4 5 6 7 8 9 10 WeiterDiese Informationen werden vom Vorgängersystem FIS bereitgestellt. Journal Archiv: 2015 | 2014 | 2013 | 2012 | 2011 | 2010 | 2009 | 2008 | 2007 | 2006 | 2005 | 2004