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Junige, M.; Sundqvist, J.: Chemical path to Atomic Layer Etching. In: Novel high-k application workshop 2016. Dresden (2016)

Junige, M.; Löffler, M.; Geidel, M.; Albert, M.; Bartha, J.W.; Zschech, E.; van Dorp, Willem F.: Area-selective Atomic Layer Deposition of Ruthenium upon Focused Electron Beam Induced Deposition Platinum patterns versus Silicon Dioxide substrate. In: Area Selective Deposition workshop "ASD 2016" : April 15th, 2016, at imec in Leuven, Belgium. Leuven, 2016 (2016)

Junige, M.; Killge, S.; Reif, J.; Geidel, M.; Albert, M.; Bartha, J.W.: The ALD of Ru and RuO2 – An intertwined special case. In: AVS 16th International Conference on Atomic Layer Deposition : 24th – 27th July 2016, Dublin, Ireland. Dublin, 2016 (2016)

Leszczynska, B.; Strobel, C.; Leszczynski, S.; Fischer, D.D.; Albert, M.; Bartha, J.W.; Stephan, U.; Kuske, J.: Deposition of Amorphous and Microcrystalline Silicon in Very High Frequency Range Up to 140 Mhz. In: 32nd European Photovoltaic Solar Energy Conference and Exhibition (2016) (2016), S. 1272–1275

Hossbach, C.; Günther, A.; Lüssem, B.; Sawatzki, M.; Henke, T.; Knaut, M.; Kasemann, D.; Shadeedi, A.A.; Albert, M.; Leo, K.; Bartha, J.W.: Organic electronic devices with inorganic high-k gate oxides grown by Atomic Layer Deposition. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

Fischer, D.; Knaut, M.; Albert, M.; Bartha, J.W.: Comparison of MLD-processes with aromatic and linear organic precursor investigated by in situ QCM and in vacuo XPS. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

Schwille, M.; Schön, F.; Knaut, M.; Bartha, J.W.: Experimental and simulative approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

Prikryl, J.; Zazpe, R.; Knaut, M.; Sopha, H.; Bartha, J.W.; Macak, J.: High-aspect ratio anodic TiO2 nanotubes: unprecedented ability of ALD to add a functionality. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

Knaut, M.; Macak, J.; Strehle, S.; Albert, M.; Bartha, J.W.: Atomic layer deposition and 3D nanoscale substrates - nanowires, nanotubes and nanopores. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

Knaut, M.; Albert, M.; Bartha, J.W.: Quartz crystal microbalance sensors for atomic layer deposition process and equipment control. In: 16th European Advanced Process Control and Manufacturing Conference (apc|m), Reutlingen, Germany (2016)

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Philipp Wenskus
Letzte Änderung: 07.02.2018