Veröffentlichungen 2014 11 bis 20 von 44 EinträgenBott, S.; Vasilev, B.; Rzehak, R.; Bartha, J. W.: Combining Short and Long Scale Effects in Modeling of Chemical-Mechanical Planarization. In: Journal of Chemical Science and Technology Jan. 2014 3 (2014), Nr. 1, S. 18–29Zimmermann, T.; Flikweert, A. J.; Merdzhanova, T.; Woerdenweber, J.; Gordijn, A.; Rau, U.; Stahr, F.; Dybek, K.; Bartha, J. W.: Deposition of intrinsic hydrogenated amorphous silicon for thin-film solar cells – a comparative study for layers grown statically by RF-PECVD and dynamically by VHF-PECVD. In: Progress in Photovoltaics Research and Applications (Impact Factor: 9.7.) 22 (2014), Nr. 2Benner, F.; Jordan, Paul M.; Richter, C.; Simon, Daniel K.; Dirnstorfer, I.; Knaut, M.; Bartha, J. W.; Mikolajick, T.: Atomic layer deposited high-κ nanolaminates for silicon surface passivation . In: Journal of Vacuum Science & Technolgy, B 32 (2014), Nr. 3, S. 03D110–03D110–6Woijcik, H.; Schwiegel, B.; Klaus, C.; Urbansky, N.; Kriz, J.; Hahn, J.; Kubasch, C.; Wenzel, C.; Bartha, J. W.: Cu barrier properties of very thin Ta and TaN films . In: Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2014 IEEE International, 20-23 May 2014, San Jose, CA (2014), S. 167–170Hossbach, C.; Fischer, D.; Schramm, T.; Albert, M.; Bartha, J. W.; Singh, A.; Richter, C.; Schröder, U.; Nehm, F.; Klumbies, H.; Müller-Meskamp, L.: Molecular Layer Deposition of Aluminum and Titanium Alkoxide for the Encapsulation of Flexible OLED Devices . In: Baltic Conference on Atomic Layer Deposition 2014 (BALD 2014), Helsinki, Finland; 05/2014 (2014)Sobottka, A.; Drößler, L.; Hossbach, C.; Abel, B.; Helmstedt, U.: A Flexible Research Reactor for Atomic Layer Deposition with a Sample-Transport Chamber for in Vacuo Analytics . In: American Journal of Nano Research and Application. Special Issue:Advanced Functional Materials 2 (2014), Nr. 6-1, S. 34–38Schroedter, R.; Janschek, K.; Sandner, T.: Jerk and Current Limited Flatness-based Open Loop Control of Foveation Scanning Electrostatic Micromirrors. In: Proc. of 19th IFAC World Congress, 24-29 August 2014, Cap Town, South Afrika (2014), S. 2685–2690Voigt, A.; Feng, W.; Allerdißen, M.; Pedrero, L.; Richter, A.: Chemical Transistors as a Basis for Chemical Computing. In: Unconventional Computation and Natural Computation 2014, London, Ontario, Canada, Poster Proceedings 28-29 (2014)Voigt, A.; Greiner, R.; Allerdißen, M.; Richter, A.; Henker, S.; Völp, M.: Towards Computation With Chemomechanical Systems. In: International Journal of Foundations of Computer Science, 24 (2014) 4 (2014), S. 507–523Junige, M.; Sharma, V.; Schmidt, D.; Albert, M.; Schubert, M.; Bartha, J. W.: Progress in Spectroscopic Ellipsometry for the in-situ real-time investigation of Atomic Layer Depositions. In: 8th Workshop Ellipsometry, Arbeitskreis Paul Drude e. V. in Dresden, 10.-12.03.2014 Vortrag (2014)Zurück 1 2 3 4 5 WeiterDiese Informationen werden vom Vorgängersystem FIS bereitgestellt.