Veröffentlichte Journal-Beiträge

81 bis 90 von 107 Einträgen

Rose, M.; Bartha, J.W.: Method to determine the sticking coefficient of precursor molecules in atomic layer depostion. In: Applied Surface Science 255 (2009), S. 6620–6623

Keil, K.; Hauptmann, M.; Choi, K.-H.; Kretz, J.; Eng, L.M.; Bartha, J.W.: Fast backscattering parameter determination in e-beam lithography with a modified doughnut test. In: Microelectronic Engineering in press (2009)

Strehle, S.; Menzel, S.; Jahn, A. ; Merkel, U.; Bartha, J.W.; Wetzig, K.: Electromigration in electroplated Cu(Ag) alloy thin films investigated by means of single damascene Blech structures. In: Microelectronic Engineering in press (2009)

Liske, R.; Wehner, S.; Preusse, A. ; Kuecher, P.; Bartha, J.W.: Influence of Additve Coadsoption on Copper Superfill Behavior. In: J. Electrochem. Soc. 156 (2009), Nr. 12, S. 955–960

Keil, K.; Choi, K.-H.; Hohle, C.; Kretz, J.; Szikszai, L.; Bartha, J.W.: Detailed characterization of hydrogen silsesquixane for e-beam applications in a dynamic random access memory pilot line environment. In: J. Vac. Sci. Technol. B 27(1) (2009), S. 1071–1023

Gorbatenko, L.S.; Novodvorsky, O.A.; Panchenko, V.Ya.; Khramova, O.D.; Cherebilo, Ye.A.; Lotin, A.A.; Wenzel, C.; Trumpaicka, N.; Bartha, J.W.: Characterization of ZnO:Ga and ZnO:N films prepared by PLD. In: Laser Physics Vol. 19, Nr. 5 (2009), S. 1152–1158

Knaut, M.; Albert, M.; Bartha, J.W.; Schmidt, D.; Schumacher, H.; Strehle, S.: Effect of wet chemical substrate pretreatment on the growth behavior of Ta(N) films deposited by thermal ALD. In: Microelectronic Engineering 85 (2008), S. 2064–2067

Naumann, A.; Kronholz, S.; Mowry, A.; Ostermay, I. ; Bierstedt, H. ; Trui, B.; Dittmar, K.; Kuecher, P.; Bartha, J.W.; Kammler, T.: Novel anhanced stressors with graded encapsulated SiGe embedded in the source and drain areas. In: Materials Science and Engineering B 154-155 (2008), S. 95–97

Ostermay, I.; Kammler, T.; Naumann, A.; Bartha, J.W.; Kuecher, P.: Investigation of the relaxation behavior of Si1-xCx alloys during epitaxal UHV-CVD growth. In: Materials Science and Engineering B 154-155 (2008), S. 90–94

Albert, M.; Bartha, J.W.: Atomlagenabscheidung als Werkzeug für die Nanotechnologie. In: Vakuum in der Forschung und Praxis 20(2008)1 (2008), S. 7–10

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Philipp Wenskus
Last modified: Oct 05, 2022