Veröffentlichte Journal-Beiträge

21 bis 30 von 107 Einträgen

Olawumi, T.; Levrau, E.; Krishtab, M.; Detavernier, C.; Bartha, J. W.; Xu, K.; Lazzarino, F.; Baklanov, M. R.: Modification of Ultra Low-k Dielectric Films by O2 and CO2 Plasmas . In: ECS J. Solid State Sci. Technol. 01/2014 4 (2015), S. N3048–N3057

Kubasch, C.; Ruelke, H.; Mayer, U.; Bartha, J. W.: Leakage Current and Breakthrough Measurements on Moisturized SiCOH. In: ECS J. Solid State Sci. Technol. 2015 4 (2015), Nr. 1, S. N3118–N3121

Kubasch, C.; Olawumi, T.; Ruelke, H.; Mayer, U.; Bartha, J. W.: Investigation of Argon Plasma Damage on Ultra Low-κ Dielectrics. In: ECS J. Solid State Sci. Technol. 2015 4 (2015), Nr. 1, S. N3023–N3028

Singh, A.; Nehm, F.; Müller-Meskamp, L.; Hossbach, C.; Albert, M.; Schroeder, U.; Leo, K.; Mikolajick, T.: OLED compatible water-based nanolaminate encapsulation systems using ozone based starting layer. In: Organic Electronics, October 2014 15 (2015), Nr. 10, S. 2587–2592

Hossbach, C.; Nehm, F.; Singh, A.; Klumbies, H.; Fischer, D.; Richter, C.; Schroeder, U.; Albert, M.; Müller-Meskamp, L.; Leo, K.; Mikolajick, T.; Bartha, J. W.: Integration of molecular-layer-deposited aluminum alkoxide interlayers into inorganic nanolaminate barriers for encapsulation of organic electronics with improved stress resistance. In: Journal of Vacuum Science & Technolgy A 01/2015 33 (2015), Nr. 1

Vankov, Yu. V.; Serov, V. V.; Ismailova, E. V.; Wenzel, C.: Rasrabotka effektivnoi mikrosystemy dlya diagnostiki v promyshlennosti : Entwicklung eines effektiven Mikrosystems für die industrielle Diagnostik. In: Nadeshnost i besopasnost energetiki No. 3(26), Sept. 2014 (2014), S. 45–47

Bott, S.; Vasilev, B.; Rzehak, R.; Bartha, J. W.: Combining Short and Long Scale Effects in Modeling of Chemical-Mechanical Planarization. In: Journal of Chemical Science and Technology Jan. 2014 3 (2014), Nr. 1, S. 18–29

Zimmermann, T.; Flikweert, A. J.; Merdzhanova, T.; Woerdenweber, J.; Gordijn, A.; Rau, U.; Stahr, F.; Dybek, K.; Bartha, J. W.: Deposition of intrinsic hydrogenated amorphous silicon for thin-film solar cells – a comparative study for layers grown statically by RF-PECVD and dynamically by VHF-PECVD. In: Progress in Photovoltaics Research and Applications (Impact Factor: 9.7.) 22 (2014), Nr. 2

Benner, F.; Jordan, Paul M.; Richter, C.; Simon, Daniel K.; Dirnstorfer, I.; Knaut, M.; Bartha, J. W.; Mikolajick, T.: Atomic layer deposited high-κ nanolaminates for silicon surface passivation . In: Journal of Vacuum Science & Technolgy, B 32 (2014), Nr. 3, S. 03D110–03D110–6

Sobottka, A.; Drößler, L.; Hossbach, C.; Abel, B.; Helmstedt, U.: A Flexible Research Reactor for Atomic Layer Deposition with a Sample-Transport Chamber for in Vacuo Analytics . In: American Journal of Nano Research and Application. Special Issue:Advanced Functional Materials 2 (2014), Nr. 6-1, S. 34–38

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Philipp Wenskus
Letzte Änderung: 05.10.2022