Publications 2007 https://tu-dresden.de/ing/elektrotechnik/ihm/hlt/forschung/publikationen-1/hlt_2007 https://tu-dresden.de/logo.png Publications 2007 1 bis 10 von 17 EinträgenHossbach, C.; Schmidt, D.; Albert, M.; Adolphi, B.; Bartha, J.W.: Remote Plasma Enhanced Atomic Layer Deposition of Tantalum Nitride using TBTDET and Atomic Hydrogen. In: Baltic ALD Conference, Oslo, Norwegen (2007)Strobel, C.; Zimmermann, T.; Albert, M.; Bartha, J.W.; Beyer, W.; Kuske, J.: Investigation on layer properties of amorphous and microcrystalline silicone deposited with moving substrates in combination with a VHF Linear Plasma Source designed for the fabrication of large area devices. In: 22rd European Photovoltaic Solar Energy Conference, 3.-7. Sept. 2007, Mailand, Italy (2007)Wojcik, H.; Friedemann, M.; Feustelt, F.; Albert, M.; Ohsiekt, S.; Metzgert, J.; Voss, J.; Bartha, J.W.; Wenzel, C.: A Comparative study of thermal and plasma enhanced ALD Ta-N-C films on SiO(sub 2), SiCOH and Cu substrates. In: 10th International Interconnect Technology Conference, Burlingame, CA, 3-6 June 2007 IEEE 2007/ISBN 1-4244-1069-X (2007), S. 17–19Richter, K.; Zschätzsch, G.; Bartha, J.W.: Positve etch profiles in silicon with improved pattern quality. In: Plasma Process. Polym. 4 (2007)Novodvorsky, O.A.; Panchenko, V.Ya.; Sokolov, V.I.; Kharmova, O.D.; Gorbatenko, L.S.; Cherebilo, Ye.A.; Wenzel, C.; Bartha, J.W.; Hiemann, H.; Bublik, V.T.; Chtcherbatchev, K.D.: Structural characteristics and photoluminescence spectra of ZnO films produced by pulsed laser deposition. In: ICONO/LAT-2007, Minsk (BY) ohne Abdruck (2007)Novodvorsky, O.A.; Kharmova, O.D.; Panchenko, V.Ya.; Gorbatenko, L.S.; Cherebilo, Ye.A.; Batishev, G.A.; Wenzel, C.; Bartha, J.W.; Bublik, V.T.; Hiemann , E.: Laser Plasma Deposition of thin ZnO films, doped by nitrogen. In: Int. Conf. Micro- & Nano-Electr., Zvenigorod (RU) ohne Abdruck (2007)Hossbach, C.; Albert, M.; Teichert, S.; Hintze, B.; Mühle, U.; Wilde, L.; Bartha, J.W.: Plasma-Enhanced Atomic Layer Deposition of High Quality Tantalum Carbonitride Thin Films. In: Proc. AVS ALD Conf., San Diego (US) ohne Abdruck (2007)Albert, M.: Atomlagenabscheidung (ALD) mit der Clusteranlage FHR – ALD 300. In: Silicon Saxony Tag, Dresden ohne Abdruck (2007)M., Stangl; J., Acker; V. , Hoffmann; V. , Wetzig; U., Künzelmann; J.W., Bartha: Application of the Copper Damascene Process for the Preparation of Electromigration Test Structures. In: Int. Conf. Planarization/CMP Technology (ICPT) (2007), S. 331–336D., Schmidt; S., Strehle; M., Albert; S., Teichert; B., Hintze; W., Hentsch; J.W., Bartha: Ternary Ta(Al)N ALD Films using Tantalum Precursors and TMA as additional Reducing Agent. In: Agent. Proc. AVS ALD Conf., San Diego (US) avail, online (2007) 1 2 WeiterDiese Informationen werden vom Vorgängersystem FIS bereitgestellt.