Veröffentlichungen Halbleitertechnik 2011 https://tu-dresden.de/ing/elektrotechnik/ihm/hlt/forschung/publikationen-1/hlt_2011 https://tu-dresden.de/logo.png Veröffentlichungen Halbleitertechnik 2011 21 bis 28 von 28 EinträgenBartha, J.W.; Knaut, M.; Junige, M.; Geidel, M.; Albert, M.: In situ monitoring for ALD process control. In: AVS 11th International Conference on Atomic Layer Deposition : June 26 – 29, 2011, Cambridge, Massachusetts, USA. Boston, 2011 (2011)Junige, M.; Knaut, M.; Geidel, M.; Riedel, S.; Endler, I.; Wojcik, H.; Albert, M.; Merkel, U.; Bartha, J.W.: Characterization of ruthenium ALD and PVD thin films for in-situ process control by spectroscopic ellipsometry. In: 6th Workshop Ellipsometry : February 21-24, 2011 Berlin, Germany. Berlin, 2011 (2011)Junige, M.; Knaut, M.; Geidel, M.; Albert, M.; Bartha, J.W.: In situ ellipsometric investigations during the ALD growth of Ru. In: AVS 11th International Conference on Atomic Layer Deposition : June 26 – 29, 2011, Cambridge, Massachusetts, USA. Boston, 2011 (2011)Junige, M.; Geidel, M.; Knaut, M.; Albert, M.; Bartha, J.W.: Monitoring atomic layer deposition processes in situ and in real-time by spectroscopic ellipsometry. In: IEEE 2011 Semiconductor Conference Dresden : September 27 to 28, 2011 - Dresden, Germany. Dresden, 2011 (2011)Strobel, C.; Leszczynska, B.; Albert, M.; Bartha, J.W.; Zimmermann, T.; Kuske, J.: Dynamic High Rate Deposition of Microcrystalline Silicon with Very High Excitation Frequencies (80-150MHz) Using Linear Plasma Sources. In: Proceedings of 26th European Photovoltaic Solar Energy Conference and Exhibition (2011) (2011), S. 2499–2501Kubasch, C.; Bartha, J.W.: Fundamental relationship between capacitance-time measurements and gravimetric measurements for water absorption in a low-k dielectric. In: Interconnect Technology Conference and 2011 Materials for Advanced Metallization (IITC/MAM), 2011 IEEE International (2011), S. 1–3Strehle, S.; Menzel, S.; Wetzig, K.; Bartha, J.W.: Microstructure of electroplated Cu(Ag) alloy thin films. In: Thin Solid Films 519 (2011), Nr. 11, S. 3522–3529Strehle, S.; Schmidt, D.; Albert, M.; Bartha, J.W.: Growth of the Initial Atomic Layers of Ta-N Films During Atomic Layer Deposition on Silicon-Based Substrates. In: Chemical Vapor Deposition 17 (2011), S. 37–44Zurück 1 2 3 Diese Informationen werden vom Vorgängersystem FIS bereitgestellt.