Publications
669 Entries
2020
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Endurance and targeted programming behavior of HfO2-FeFETs, May 2020, 2020 IEEE International Memory Workshop (IMW). Dresden: Institute of Electrical and Electronics Engineers (IEEE), 9108131Electronic (full-text) versionResearch output: Contribution to book/conference proceedings/anthology/report > Conference contribution
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FeFET: A versatile CMOS compatible device with game-changing potential, May 2020, 2020 IEEE International Memory Workshop (IMW). Dresden: Institute of Electrical and Electronics Engineers (IEEE), 9108150Electronic (full-text) versionResearch output: Contribution to book/conference proceedings/anthology/report > Conference contribution
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Thickness Scaling of AFE-RAM ZrO2 Capacitors with High Cycling Endurance and Low Process Temperature, May 2020, 2020 IEEE International Memory Workshop, IMW 2020 - Proceedings. Institute of Electrical and Electronics Engineers (IEEE), 9108146Electronic (full-text) versionResearch output: Contribution to book/conference proceedings/anthology/report > Conference contribution
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Inherent Charge-Sharing-Free Dynamic Logic Gates Employing Transistors With Multiple Independent Inputs, 9 Apr 2020, In: IEEE journal of the Electron Devices Society. 8, p. 740-747, 8 p.Electronic (full-text) versionResearch output: Contribution to journal > Research article
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Normally-Off Operation of Lateral Field-Effect Transistors Fabricated from Ultrapure GaN/AlGaN Heterostructures, 1 Apr 2020, In: Physica Status Solidi (A) Applications and Materials Science. 217, 7, 1900732Electronic (full-text) versionResearch output: Contribution to journal > Research article
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Photoluminescence dynamics in few-layer InSe, Apr 2020, In: Physical review materials. 4, 4, 044001Electronic (full-text) versionResearch output: Contribution to journal > Research article
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Switching and Charge Trapping in HfO2-based Ferroelectric FETs: An Overview and Potential Applications, Apr 2020, 4th Electron Devices Technology and Manufacturing Conference, EDTM 2020 - Proceedings. Institute of Electrical and Electronics Engineers (IEEE), 9118005Electronic (full-text) versionResearch output: Contribution to book/conference proceedings/anthology/report > Conference contribution
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The Past, the Present, and the Future of Ferroelectric Memories, Apr 2020, In: IEEE transactions on electron devices : ED. 67, 4, p. 1434 - 1443, 10 p.Electronic (full-text) versionResearch output: Contribution to journal > Research article
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HfxZr1 − xO2 thin films for semiconductor applications: An Hf- and Zr-ALD precursor comparison, Mar 2020, In: Journal of vacuum science & technology : JVST ; A, Vacuum, surfaces, and films. 38, 2, 022402Electronic (full-text) versionResearch output: Contribution to journal > Research article
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Influence of the active leakage current pathway on the potential induced degradation of CIGS thin film solar modules, Feb 2020, In: Solar energy : the official journal of the International Solar Energy Society. 197, p. 455-461, 7 p.Electronic (full-text) versionResearch output: Contribution to journal > Research article