Publications
690 Entries
2020
-
Quantum and transport lifetimes in optically induced GaN/AlGaN 2DEGs grown on bulk GaN, Jul 2020, In: Journal of vacuum science & technology : JVST ; B, Nanotechnology & microelectronics : materials, processing, measurement, & phenomena. 38, 4, 042203Electronic (full-text) versionResearch output: Contribution to journal > Research article
-
Top-Down Fabricated Reconfigurable FET With Two Symmetric and High-Current On-States, Jul 2020, In: IEEE electron device letters. 41, 7, p. 1110 - 1113, 4 p.Electronic (full-text) versionResearch output: Contribution to journal > Research article
-
Depolarization as Driving Force in Antiferroelectric Hafnia and Ferroelectric Wake-Up, 23 Jun 2020, In: ACS applied electronic materials. 2, 6, p. 1583-1595, 13 p.Electronic (full-text) versionResearch output: Contribution to journal > Research article
-
Hafnium oxide as an enabler for competitive ferroelectric devices, Jun 2020, p. 1-2, 2 p.Electronic (full-text) versionResearch output: Contribution to conferences > Paper
-
Size effect of electronic properties in highly arsenic-doped silicon nanowires, Jun 2020, In: Solid-state electronics. 168, 107724Electronic (full-text) versionResearch output: Contribution to journal > Research article
-
SoC compatible 1 T1 C FeRAM memory array based on ferroelectric Hf0.5Zr0.5O2, Jun 2020, 2020 IEEE Symposium on VLSI Technology. Honolulu: Institute of Electrical and Electronics Engineers (IEEE), 9265063Electronic (full-text) versionResearch output: Contribution to book/conference proceedings/anthology/report > Conference contribution
-
Towards scalable reconfigurable field effect transistor using flash lamp annealing, Jun 2020Electronic (full-text) versionResearch output: Contribution to conferences > Paper
-
Endurance and targeted programming behavior of HfO2-FeFETs, May 2020, 2020 IEEE International Memory Workshop (IMW). Dresden: Institute of Electrical and Electronics Engineers (IEEE), 9108131Electronic (full-text) versionResearch output: Contribution to book/conference proceedings/anthology/report > Conference contribution
-
FeFET: A versatile CMOS compatible device with game-changing potential, May 2020, 2020 IEEE International Memory Workshop (IMW). Dresden: Institute of Electrical and Electronics Engineers (IEEE), 9108150Electronic (full-text) versionResearch output: Contribution to book/conference proceedings/anthology/report > Conference contribution
-
Thickness Scaling of AFE-RAM ZrO2 Capacitors with High Cycling Endurance and Low Process Temperature, May 2020, 2020 IEEE International Memory Workshop, IMW 2020 - Proceedings. Institute of Electrical and Electronics Engineers (IEEE), 9108146Electronic (full-text) versionResearch output: Contribution to book/conference proceedings/anthology/report > Conference contribution