Publications Archive 2006 | 2007 | 2008 | 2009 | 2010 | 2011 | 2012 | 2013 | 2014 | 2015 41 bis 50 von 284 EinträgenKnaut, M.; Macak, J.; Strehle, S.; Albert, M.; Bartha, J.W.: Atomic layer deposition and 3D nanoscale substrates - nanowires, nanotubes and nanopores. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)Knaut, M.; Albert, M.; Bartha, J.W.: Quartz crystal microbalance sensors for atomic layer deposition process and equipment control. In: 16th European Advanced Process Control and Manufacturing Conference (apc|m), Reutlingen, Germany (2016)Knaut, M.; Albert, M.: HfO2 ALD – A process development with in situ quartz crystal microbalances. In: 15th AVS conference on Atomic Layer Deposition, Portland, OR, USA (2015)Nehm, F.; Klumbies, H.; Richter, C.; Singh, A.; Schroeder, U.; Mikolajick, T.; Mönch, T.; Hossbach, C.; Albert, M.; Bartha, J.W.; Leo, K.; Müller-Meskamp, L.: Breakdown and Protection of ALD Moisture Barrier Thin Films. In: ACS Appl. Mater. Interfaces, 2015, 7 (40) (2015), S. 22121–22127Charania, S.; Killge, S.; Bartha, J.W.: Development of ultra high speed on-chip Optical Interconnects by state of the art Si etching process and Nano Imprint Lithography. In: Conference: semicon 2015 - Advanced Packaging Conference (APC) (2015)Thrun, X.; Browning, C.; Choi, K.-H.; Figueiro, T.; Hohle, C.; Saib, M.; Schlavone, P.; Bartha, J.W.: Sensitivity analysis for high accuracy proximity effect correction . In: Proc. SPIE 9635, Photomask Technology 2015, 963515 (October 23, 2015) (2015)Strobel, C.; Leszczynska, B.; Merkel, U.; Kuske, J.; Fischer, D.D.; Albert, M.; Holovský, J.; Michard, S.; Bartha, J.W.: High efficiency high rate microcrystalline silicon thin-film solar cells deposited at plasma excitation frequencies larger than 100 MHz. In: Sol. Energy Mater. Sol. Cells 143 (2015), S. 347–353Hauke, A.; Hossbach, C.; Sawatzki, M.; Kasemann, D.; Bartha, J.W.; Leo, K.: Controlling threshold voltage and leakage currents in vertical organic field-effect transistors by inversion mode operation . In: Applied Physics Letters > Volume 107, Issue 23 (2015)Wenzel, C.: Einfluß von Darstellungsmethoden auf die Morphologie und Mikrosruktur Dünner Schichten. In: Morphologie und Mikrostruktur Dünner Schichten und deren Beeinflussung: Workshop am 12. März 2015 in Dresden; Tagungsband EFDS, 2015 (2015)Simon, D. K.; Henke, T.; Jordan, P. M.; Fengler, F. P. G.; Mikolajick, T.; Bartha, J.W.; Dirnstorfer, I.: Low-thermal budget flash light annealing for Al2O3 surface passivation. In: Physica Status Solidi (RRL) – Rapid Research Letters 9 (2015), Nr. 11, S. 631–635Zurück 1 2 3 4 5 6 7 8 9 10 WeiterDiese Informationen werden vom FIS bereitgestellt. Categories Journals | Conferencens | Books | Patents