Veröffentlichte Journal-Beiträge

1 bis 10 von 107 Einträgen

Strobel, C.; Chavarin, C.A.; Kitzmann, J.; Lupina, G.; Wenger, C.; Albert, M.; Bartha, J.W.: Towards high frequency heterojunction transistors: Electrical characterization of N-doped amorphous silicon-graphene diodes. In: Journal of Applied Physics 121 (2017)

Junige, M.; Löffler, M.; Geidel, M.; Albert, M.; Bartha, J.W.; Zschech, E.; Rellinghaus, B.; van Dorp, W.F.: Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2 substratum. In: Nanotechnology 28 (2017), Nr. 39 (2017), S. 395301

Henke, T.; Knaut, M.; Geidel, M.; Winkler, F.; Albert, M.; Bartha, J.W.: Atomic layer deposition of tantalum oxide thin films using the precursor tert-butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film properties. In: Thin Solid Films 627 (2017), S. 94–105

Patommel, J.; Klare, S.; Hoppe, R.; Ritter, S.; Samberg, D.; Wittwer, F.; Jahn, A.; Richter, K.; Wenzel, C.; Bartha, J.W.; Scholz, M.; Seiboth, F.; Boesenberg, U.; Falkenberg, G.; Schroer, C.G.: Focusing hard x rays beyond the critical angle of total reflection by adiabatically focusing lenses. In: Appl. Phys. Lett. 110, 101103 (2017)

Schwille, M.; Barth, J.; Schössler, T.; Schön, F.; Bartha, J.W.; Oettel, M.: Simulation approach of Atomic Layer Deposition in large 3D structures. In: Modelling and Simulation in Materials Science and Engineering (2017)

Schwille, C.; Schössler, T.; Schön, F.; Oettel, M.; Bartha, J.W.: Temperature dependence of the sticking coefficients of bis-diethyl aminosilane and trimethylaluminum in atomic layer deposition. In: J. Vac. Sci. Technol. A 35 , 01B119 (2017)

Schwille, M. C.; Schössler, T.; Barth, J.; Knaut, M.; Schön, F.; Höchst, A.; Oettel, M.; Bartha, J.W.: Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures . In: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35, 01B118 (2017)

Henke, T.; Knaut, M.; Hossbach, C.; Geidel, M.; Albert, M.; Bartha, J.W.: Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition . In: Surface & Coatings Technology 309 (2017), S. 600–608

Al-Shadeedi, A.; Liu, S.; Keum, Chang-Min; Kasemann, D.; Hossbach, C.; Bartha, J.W.; Bunge, Scott D; Lüssem, B.: Minority Currents in n-Doped Organic Transistors. In: ACS Appl. Mater. Interfaces, 2016, 8 (47), pp 32432–32439 (2016)

Nehm, F.; Dollinger, F.; Klumbies, H.; Müller-Meskamp, L.; Leo, K.; Singh, A.; Richter, C.; Schroeder, U.; Mikolajick, T.; Hossbach, C.; Albert, M.; Bartha, J.W.: Atomic layer deposited TiOx/AlOx nanolaminates as moisture barriers for organic devices. In: Organic Electronics Volume 38, November 2016 (2016), S. 84–88

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Philipp Wenskus
Last modified: Oct 05, 2022