Veröffentlichte Konferenzbei­träge

101 bis 110 von 171 Einträgen

Junige, M.; Knaut, M.; Geidel, M.; Albert, M.; Bartha, J.W.: In-situ spectroscopic ellipsometry during the atomic layer deposition of ruthenium and ruthenium oxide. In: 3rd NanoCharm Workshop on Non-Destructive Real Time Process Control. Berlin, 2010 (2010)

Hossbach, C.; Henke, T.; Gatineau, J.; Zauner, A.; Strehle, S.; Knaut, M.; Bertram, M.; Geidel, M.; Schmiegel, C.; Albert, M.; Gluch, J.; Neidhardt, J.; Bartha, J.W.: Evaluation of the Novel Iridium Precursor Ir(EtCp)(MeCHD) for ALD of Iridium Thin Films. In: Proceeding of Baltic ALD / GerALD Conference 2010, Hamburg, Germany (2010) (2010)

Parshina, L.S.; no, O.A.; Panchenko, V.Ya.; Khramova, O.D.; Cherebilo, Ye.A.; Lotin, A.A.; Wenzel, C.; Trumpaicka, N.; Bartha, J.W.: Optical properties of nitrogen and phosphorus doped ZnO thin films fabricated by PLD method. In: Proceedings of X International Conference "Laser and Laser-Information Technologies: Fundamental Problems and Applications" (ILLA’2009, Smolyan, Bulgaria, 2009). Plovdiv, Bulgaria (2010), S. 109–115

Parshina, L.S.; Novodvorsky, O.A.; Panchenko, V.Ya.; Khramova, O.D.; Cherebilo, Ye.A.; Lotin, A.A.; Zuev, D.A.; Khaydukov, E.V.; Wenzel, C.; Trumpaicka, N.; Bartha, J.W.: Electric and optical properties of phosphorus doped (Zn,Mg)O thin films fabricated by pulsed laser deposition. In: Book of abstract of the 18th International Conference on Advanced Laser Technologies (ALT’10), Egmond aan Zee, the Netherlands, 11-16 September 2010 (2010), S. 148

Richter, K.; Kubasch, C.; Bartha, J.W.: Investigation of the influence of oxygen plasma on the copper surface. In: Posterbeitrag zur 12th International Conference on Plasma Surface Engineering PSE 2010 13. - 17. 9. 2010, Garmisch-Partenkirchen; Proceedings PSE 2010 (2010)

Knaut, M.; Geidel, M.; Krause, M.; Albert, M.; Bartha, J.W.: Ultra-thin AlxTi1-xOy films deposited by atomic layer deposition for DRAM capacitors and quantum devices. In: Proceeding of Nanofair Conference 2010, Dresden, Germany (2010)

Junige, M.; Knaut, M.; Geidel, M.; Albert, M.; Bartha, J.W.: In-situ characterization of ruthenium and ruthenium dioxide film growth. In: Proceeding of Baltic ALD / GerALD Conference 2010, Hamburg, Germany (2010)

Knaut, M.; Geidel, M.; Junige, M.; Krause, M.; Albert, M.; Bartha, J.W.: In-situ analysis of ultra thin ALD capacitor stacks for novel applications. In: Proceeding of AVS ALD Conference 2010, Seoul, Korea (2010)

Wojcik, H.; Kaltofen, R.; Merkel, U.; Krien, C.; Strehle, S.; Gluch, J.; Knaut, M.; Wenzel, C.; Preusse, A.; Bartha, J.W.; Geidel, M.; Adolphi, B.; Neumann, V.; Liske, R.: Electrical Evaluation of Ru-W(-N), Ru-Ta(-N) and Ru-Mn films as Cu diffusion barriers. In: AMC 2010, Albany, N.Y. 3.-6.Oct. 2010) in Microelectronic Engineering, article submitted (2010)

Niese, S.; Hecker, M.; Liske, R.; Ritz, Y.; Zschech, E.; Wojcik, H.; Bartha, J.W.; Wud, Z.; Hod, P.S.: Assessment Of Mechanical Properties Of Nanoscale Structures For Microprocessor Manufacturing . In: 11th International Workshop on Stress-Induced Phenomena in Metallization April 12 - 14, 2010, Dresden Poster (2010)

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Philipp Wenskus
Letzte Änderung: 05.10.2022