Veröffentlichte Konferenzbei­träge

111 bis 120 von 171 Einträgen

Wojcik, H.; Kaltofen, R.; Merkel, U.; Krien, C.; Strehle, S.; Gluch, J.; Knaut, M.; Liske, R.; Wenzel, C.; Bartha, J.W.: Evaluation of novel Ru-W(-N) films as Cu diffusion barriers for sub 32nm BEOL technology . In: Nanofair 2010, Dresden Poster (2010)

Wojcik, H.; Merkel, U.; Jahn, A.; Richter, K.; Junige, M.; Klein, C.; Gluch, J.; Albert, M.; Munnik, F.; Wenzel, C.; Bartha, J.W.: Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements. In: Microelectronic Engineering, In Press, Corrected Proof, Available online 11 July 2010 (MAM 2010 als Poster) (2010)

Schumacher, H.; Künzelmann, U.; Bartha, J.W.: Characterisation of Surface Processes during Oxide CMP by in situ FTIR Spectroscopy with Microstructured Reflection Elements at Silicon Wafers. In: Advanced Interconnects and Chemical Mechanical Planarization for Micro- and Nanoelectronics, MRS Spring Meeting 2010, San Francisco, CA, 5. - 7. April 2010 Materials Research Society - Symposium Proceedings, 1249 (2010), S. 135–140

Estel, K.; Künzelmann, U.; Bartha, J.W.; Mayer, E.-P.; Barthel, H.: Influence of Ionic Strength and pH-Value on the Silicon Dioxide Polishing Behaviour of Slurries based on Pure Silica Suspensions. In: Advanced Interconnects and Chemical Mechanical Planarization for Micro- and Nanoelectronics, MRS Spring Meeting 2010, San Francisco, CA, 5. - 7. April 2010 Materials Research Society - Symposium Proceedings, 1249 (2010), S. 97–102

Künzelmann, U.; Schumacher, H.; Bartha, J.W.: In situ-ATR-FTIR-Untersuchungen zur Wirkungsweise von Additiven in TSV-Cu-Elektrolyten. In: Industriepartnersymposium, Dresden, 30. Sept. 2010 Poster (2010)

Estel, K.; Künzelmann, U. ; Bartha, J.W.; Mayer, E.-P.; Barthel, H.: Influence of Ionic Strengths and pH-Values of Model-Slurries for Chemical Mechanical Silicon Dioxide Polishing with different Nanodispersed Pure Silica Suspensions. In: Nanofair 2010, Dresden, 6.-7. Juli 2010 Poster (2010)

Geidel, M.; Knaut, M.; Albert, M.; Bartha, J.W.: In-situ XPS study on the growth of ultra-thin Al-O and Ti-O based films with atomic layer deposition. In: E-MRS 2010 Spring Meeting in Strasbourg, 07.06.2010-11.06.2010 Poster (2010)

Strobel, C.; Leszczynska, B. ; Zimmermann, T.; Albert, M.; Bartha, J.W.; Kuske, J.: Dynamic VHF-PECVD concept tool with linear plasma sources for silicon based thin film solar cells. In: Proceedings of the 25th European Photovoltaic Solar Energy Conference, Valencia, 2010 (2010)

Parshina, L.S.; Novodvorsky, O.A.; Panchenko, V.Ya.; Khramova, O.D.; Cherebilo, Ye.A.; Lotin, A.A.; Wenzel, C.; Trumpaicka, N.; Bartha, J.W.: Electric properties of heterogeneous transitions between n - and p - type ZnO films and n - and p - type silicon substrates. In: Book of abstract of the 17th International Conference on Advanced Laser Technologies, Antalya, Turkey, September 26- October 01 (2009), S. 162

Khramova, O.D.; Novodvorsky, O.A.; Panchenko, V.Ya.; Sokolov, V.I.; Parshina, L.S.; Cherebilo, Ye.A.; Lotin, A.A.; Khaydukov, E.V.; Rocheva, V.V.; Wenzel, C.; Bartha, J.W.: The influence of annealing on characteristics ZnO:N films. In: Book of abstract of the 17th International Conference on Advanced Laser Technologies, Antalya, Turkey, September 26- October 01 (2009), S. 69

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Philipp Wenskus
Letzte Änderung: 05.10.2022