Veröffentlichte Konferenzbeiträge 151 bis 160 von 171 EinträgenNovodvorsky, O.A.; Kharmova, O.D.; Panchenko, V.Ya.; Gorbatenko, L.S.; Cherebilo, Ye.A.; Batishev, G.A.; Wenzel, C.; Bartha, J.W.; Bublik, V.T.; Hiemann , E.: Laser Plasma Deposition of thin ZnO films, doped by nitrogen. In: Int. Conf. Micro- & Nano-Electr., Zvenigorod (RU) ohne Abdruck (2007)Hossbach, C.; Albert, M.; Teichert, S.; Hintze, B.; Mühle, U.; Wilde, L.; Bartha, J.W.: Plasma-Enhanced Atomic Layer Deposition of High Quality Tantalum Carbonitride Thin Films. In: Proc. AVS ALD Conf., San Diego (US) ohne Abdruck (2007)Albert, M.: Atomlagenabscheidung (ALD) mit der Clusteranlage FHR – ALD 300. In: Silicon Saxony Tag, Dresden ohne Abdruck (2007)M., Stangl; J., Acker; V. , Hoffmann; V. , Wetzig; U., Künzelmann; J.W., Bartha: Application of the Copper Damascene Process for the Preparation of Electromigration Test Structures. In: Int. Conf. Planarization/CMP Technology (ICPT) (2007), S. 331–336D., Schmidt; S., Strehle; M., Albert; S., Teichert; B., Hintze; W., Hentsch; J.W., Bartha: Ternary Ta(Al)N ALD Films using Tantalum Precursors and TMA as additional Reducing Agent. In: Agent. Proc. AVS ALD Conf., San Diego (US) avail, online (2007)S., Nawka; E., Erben; B., Adolphi; J.W., Bartha: Characterization of the initial growth of hafnium silicate films in dependence of process parameters and substrate materials. In: Proc. EMRS Fall-Meet., Warschau (PL) (2007)S., Menzel; D., Reitz; U., Künzelmann; M., Albert; J.W., Bartha: Fabrication of Surface Acoustic Wave Structures with buried Copper IDTs using the Copper Damascene Process. In: Tag.-Bd. Int. Conf. Planarization/CMP Technology (ICPT) (2007), S. 479–485S., Menzel; C., Hossbach; J., Thomas; M., Albert; T., Gemming; M., Stangl; S., Hampel: ALD of Ta-based Adhesion Layers for CNT-Cu Matrix Composite Film Growth. In: Proc. MSR Spring Meet., San Francisco (US) (2007)Schmidt, D.; Hossbach, C.; Albert, M.; Bartha, J.W.; Menzel, S.: In-Situ Metrology for improved Atomic Layer Deposited TaN Properties by Supplying Additional Energy. In: Agent. Proc. AVS ALD Conf., San Francisco (US) avail, online (2006)Novodvorski, O.A.; Panchenko, V.Ya.; Chramova, O.D.; Gorbatenko, L.S.; Butorina, Ye.A.; Wenzel, C.; Bartha, J.W.: Optical and structural characteristics of ZnO filmsdoped with Ga. In: SPIE 6161 6161 (2006), S. OH1–OH10Zurück 9 10 11 12 13 14 15 16 17 18 WeiterDiese Informationen werden vom Vorgängersystem FIS bereitgestellt.