Veröffentlichte Konferenzbei­träge

11 bis 20 von 171 Einträgen

Junige, M.; Kitzmann, J.; Geidel, M.; Lupina, G.; Albert, M.; Wenger, C.; Bartha, J.W.: Al2O3 ALD on pristine graphene. In: DPG-Frühjahrstagung der Sektion Kondensierte Materie. Dresden, 2017 Vortrag (2017)

Neumann, N.; Charania, S.; Killge, S.; al-Husseini, Z.; Henker, R.; Ellinger, F.; Bartha, J.W.; Plettemeier, D.: Modeling and characterization of optical TSVs . In: SPIE 10325, Optical Fibers and Their Applications 2017, 103250O, Optical Fibers and Their Applications 2017, Supraśl, Poland, Poland | January 23, 2017 (2017)

Killge, S.; Charania, S.; Richter, K.; Bartha, J.W.: Towards the realization of optical interconnets on Si interposer. In: Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2016 IEEE International, 23-26 May 2016 (2016)

Millat, S.; Hoeft, J. T.; Bartha, J.W.: SEM Based Overlay - development of dedicated workflow using new imaging capability on CD-SEM for inline process control within Semiconductor manufacturing environment. In: Conference: 16TH EUROPEAN ADVANCED PROCESS CONTROL AND MANUFACTURING (APC|M) CONFERENCE, At Reutlingen (Stuttgart), GERMANY (2016)

Killge, S.; Junige, M.; Geidel, M.; Neumann, V.; Wenzel, C.; Knaut, M.; Albert, M.; Bartha, J.W.: 3D integration: ALD Ruthenium layers grown on metallic and oxide interfaces for TSV with high aspect ratios – Why blisters? In: MAM 2016 – Materials for advanced metalization : 20th – 23th March 2016, Brussels, Belgium. Brussels, 2016 (2016)

Lupina, G.; Strobel, C.; Junige, M.; Kitzmann, J.; Lukosius, M.; Albert, M.; Bartha, J.W.; Wenger, C.: Dielectric-Graphene and Silicon-Graphene integration for Graphene-Based Devices. In: Graphene 2016 : April 19-22, 2016, Genoa, Italy. Genoa, 2016 (2016)

Junige, M.; Sundqvist, J.: Chemical path to Atomic Layer Etching. In: Novel high-k application workshop 2016. Dresden (2016)

Junige, M.; Löffler, M.; Geidel, M.; Albert, M.; Bartha, J.W.; Zschech, E.; van Dorp, Willem F.: Area-selective Atomic Layer Deposition of Ruthenium upon Focused Electron Beam Induced Deposition Platinum patterns versus Silicon Dioxide substrate. In: Area Selective Deposition workshop "ASD 2016" : April 15th, 2016, at imec in Leuven, Belgium. Leuven, 2016 (2016)

Junige, M.; Killge, S.; Reif, J.; Geidel, M.; Albert, M.; Bartha, J.W.: The ALD of Ru and RuO2 – An intertwined special case. In: AVS 16th International Conference on Atomic Layer Deposition : 24th – 27th July 2016, Dublin, Ireland. Dublin, 2016 (2016)

Leszczynska, B.; Strobel, C.; Leszczynski, S.; Fischer, D.D.; Albert, M.; Bartha, J.W.; Stephan, U.; Kuske, J.: Deposition of Amorphous and Microcrystalline Silicon in Very High Frequency Range Up to 140 Mhz. In: 32nd European Photovoltaic Solar Energy Conference and Exhibition (2016) (2016), S. 1272–1275

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Philipp Wenskus
Letzte Änderung: 05.10.2022