Veröffentlichte Konferen­zbeiträge

21 bis 30 von 171 Einträgen

Hossbach, C.; Günther, A.; Lüssem, B.; Sawatzki, M.; Henke, T.; Knaut, M.; Kasemann, D.; Shadeedi, A.A.; Albert, M.; Leo, K.; Bartha, J.W.: Organic electronic devices with inorganic high-k gate oxides grown by Atomic Layer Deposition. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

Fischer, D.; Knaut, M.; Albert, M.; Bartha, J.W.: Comparison of MLD-processes with aromatic and linear organic precursor investigated by in situ QCM and in vacuo XPS. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

Schwille, M.; Schön, F.; Knaut, M.; Bartha, J.W.: Experimental and simulative approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

Prikryl, J.; Zazpe, R.; Knaut, M.; Sopha, H.; Bartha, J.W.; Macak, J.: High-aspect ratio anodic TiO2 nanotubes: unprecedented ability of ALD to add a functionality. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

Knaut, M.; Macak, J.; Strehle, S.; Albert, M.; Bartha, J.W.: Atomic layer deposition and 3D nanoscale substrates - nanowires, nanotubes and nanopores. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

Knaut, M.; Albert, M.; Bartha, J.W.: Quartz crystal microbalance sensors for atomic layer deposition process and equipment control. In: 16th European Advanced Process Control and Manufacturing Conference (apc|m), Reutlingen, Germany (2016)

Knaut, M.; Albert, M.: HfO2 ALD – A process development with in situ quartz crystal microbalances. In: 15th AVS conference on Atomic Layer Deposition, Portland, OR, USA (2015)

Charania, S.; Killge, S.; Bartha, J.W.: Development of ultra high speed on-chip Optical Interconnects by state of the art Si etching process and Nano Imprint Lithography. In: Conference: semicon 2015 - Advanced Packaging Conference (APC) (2015)

Wenzel, C.: Einfluß von Darstellungsmethoden auf die Morphologie und Mikrosruktur Dünner Schichten. In: Morphologie und Mikrostruktur Dünner Schichten und deren Beeinflussung: Workshop am 12. März 2015 in Dresden; Tagungsband EFDS, 2015 (2015)

Rebohle, L.; Schumann, T.; Prucnal, S.; Skorupa, W.; Henke, T.: Temperature distribution during flash lamp annealing of thin film multilayer systems : Vortrag. In: E-MRS 2015 Fall Meeting, 15-18 September 2015, Warsaw, Poland, 2015 (2015)

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Philipp Wenskus
Last modified: Oct 05, 2022