Veröffentlichte Konferenzbei­träge

41 bis 50 von 171 Einträgen

Fischer, D. D.; Leszczynska, B.; Albert, M.; Bartha, J. W.; Stephan, U.; Kuske, J.; Prager, N.; Fahland, M.: Development and Investigation of Thin Film Solar Cells on Flexible Substrates Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition (VHF-PECVD) Technique. In: 29th European Photovoltaic Solar Energy Conference and Exhibition, 3DV.4.24, Amsterdam, Netherlands, 22.09.-26.09.2014 (2014), S. 1929–1932

Woijcik, H.; Schwiegel, B.; Klaus, C.; Urbansky, N.; Kriz, J.; Hahn, J.; Kubasch, C.; Wenzel, C.; Bartha, J. W.: Cu barrier properties of very thin Ta and TaN films . In: Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2014 IEEE International, 20-23 May 2014, San Jose, CA (2014), S. 167–170

Hossbach, C.; Fischer, D.; Schramm, T.; Albert, M.; Bartha, J. W.; Singh, A.; Richter, C.; Schröder, U.; Nehm, F.; Klumbies, H.; Müller-Meskamp, L.: Molecular Layer Deposition of Aluminum and Titanium Alkoxide for the Encapsulation of Flexible OLED Devices . In: Baltic Conference on Atomic Layer Deposition 2014 (BALD 2014), Helsinki, Finland; 05/2014 (2014)

Junige, M.; Sharma, V.; Schmidt, D.; Albert, M.; Schubert, M.; Bartha, J. W.: Progress in Spectroscopic Ellipsometry for the in-situ real-time investigation of Atomic Layer Depositions. In: 8th Workshop Ellipsometry, Arbeitskreis Paul Drude e. V. in Dresden, 10.-12.03.2014 Vortrag (2014)

Müller, M. R.; Künzelmann, U.; Menzel, S.; Petrov, I.; Kallis, K.; Knoch, J.: Tackling Hillocks Growth after Aluminum CMP. In: ICPT 2014 International Conference on Planarization /CMP Technology, Kobe, Japan, November 19-21, 2014 (2014)

Junige, M.; Wenger, C.; Darakchieva, V.; Oddoy, T.; Lupina, G.; Albert, M.; Bartha, J. W.: Atomic Layer Depositions on Graphene - An investigation by joint in-situ real-time Spectroscopic Ellipsometry and direct surface analysis. In: 1st Turkish-German Workshop for Graphene-based electronic devices in Elazığ, Turkey, 20.-23.05.2014 Vortrag (2014)

Junige, M.; Walther, T. F.; Tanner, R.; Albert, M.; Bartha, J. W.: Growth kinetics and film properties of tantalum nitride ALD investigated by in-situ real-time ellipsometry and in-vacuo surface analysis. In: 12th International Baltic ALD conference, At Helsinki, Finland, 12.-13.05.2014 Vortrag (2014)

Junige, M.; Tanner, R.; Wenger, C.; Lupina, G.; Albert, M.; Bartha, J. W.: Ta2O5 by thermal-activated ALD. In: Conference: DPG Frühjahrstagung Dresden, 30.03.-04.04.2014 Vortrag (2014)

Strobel, C.; Leszczynska, B.; Leszczynski, S-; Merkel, U.; Kuske, J.; Fischer, D. D.; Albert, M.; Holovský, J.; Bartha, J. W.: Static and Dynamic VHF-Deposition of Microcrystalline Silicon at 140 MHz with Rates Up to 2.5 Nm/s. In: 29th European Photovoltaic Solar Energy Conference and Exhibition, Amsterdam (2014), S. 1917–1920

Henke, T.; Knaut, M.; Hossbach, C.; Geidel, M.; Rebohle, L.; Albert, M.; Skorupa, W.; Bartha, J. W.: Flash-Lamp-Enhanced Atomic Layer Deposition of Thin Films. In: 226th ECS-Meeting, Symposium P1 - Atomic Layer Deposition Applications 10, 5.-9. Oktober 2014, Cancun, Mexiko ECS Transactions 64 (9) (2014), S. 167–189

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Philipp Wenskus
Letzte Änderung: 05.10.2022