Veröffentlichte Konferenzbei­träge

71 bis 80 von 171 Einträgen

Singh, A.; Hossbach, C.; Hodson, C.; Fang, Qi; Schröder, U.; Mikolajick, T.: Low temperature HfO2 and Al2O3 single layer and multilayer structures. In: 12th International Conference on Atomic Layer Deposition AVS-ALD & Baltic ALD 2012: June 18 – 20, 2012, Dresden (2012)

Hossbach, C.; Drees, M.; Seiffert, D.; Strehle, S.; Junige, M.; Albert, M.; Bartha, J.W.: The Initial Growth of Tantalum Nitride ALD: A Comparative Quantum Chemical and In Situ Experimental Study. In: 12th International Conference on Atomic Layer Deposition AVS-ALD & Baltic ALD 2012: June 18 – 20, 2012, Dresden (2012)

Kubasch, C.: Detection of Water in Low-k Dielectric Film. In: EUFANET, Smart Failure Analysis for New Materials in Electronic Devices, 17.-18. September 2012, Dresden Vortrag (2012)

Leszczynska, B.; Strobel, C.; Albert, M.; Bartha, J.W.; Kuske, J.: High Rate PECVD Deposition of Silicon Thin Films at Very High Excitation Frequencies (81.36-140 MHz). In: Proceedings of 27th European Photovoltaic Solar Energy Conference and Exhibition 2012 (2012), S. 2507–2510

Junige, M.; Albert, M.; Bartha, J.W.: Opportunities and challenges of ellipsometry for process monitoring in atomic layer deposition. In: 7th Workshop Ellipsometry : March 05-07, 2012 Leipzig, Germany. Leipzig, 2012 Vortrag und Poster (2012)

Junige, M.; Geidel, M.; Knaut, M.; Albert, M.; Bartha, J.W.: Basic investigations of ruthenium’s ALD growth initiation. In: AVS 12th International Conference on Atomic Layer Deposition : June 17 – 20, 2012, Dresden, Germany. Dresden, 2012 Poster (2012)

Junige, M.; Geidel, M.; Knaut, M.; Albert, M.; Bartha, J.W.: Atomic layer deposition monitored and characterized by joint in situ real-time spectroscopic ellipsometry and direct surface analysis. In: AVS 59th Annual International Symposium and Exhibition : October 28 – November 02, 2012, Tampa, Florida, USA. Tampa, Florida, 2012 Vortrag (2012)

Geidel, M.; Hossbach, C.; Knaut, M.; Albert, M.; Bartha, J.W.: In-situ analysis of Al2O3 ALD growth on PET and PEN substrates for flexible organic electronics. In: 12th International Conference on Atomic Layer Deposition AVS-ALD & Baltic ALD 2012: June 18 – 20, 2012, Dresden, Germany. Vortrag (2012)

Henke, T.; Hossbach, C.; Knaut, M.; Geidel, M.; Singh, A.; Albert, M.; Bartha, J.W.: Densification of Low-Temperature ALD Aluminum Oxide Thin Films by in-situ Flash Annealing. In: Proceedings of AVS 12th International Conference on Atomic Layer Deposition, June 17 – 20, 2012, Dresden, Germany (2012)

Knaut, M.; Junige, M.; Wojcik, H.; Neumann, V.; Hiess, A.; Henke, T.; Albert, M.; Bartha, J.W.; Hoßbach, C.: Atomic layer deposition for high aspect ratio through silicon vias. In: Materials for Advanced Metallization 2012, Grenoble, France (2012)

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Philipp Wenskus
Letzte Änderung: 05.10.2022