Veröffentlichte Konferenzbeiträge 81 bis 90 von 171 EinträgenKnaut, M.; Albert, M.; Bartha, J.W.; Dirnstorfer, I.; Mähne, H.; Jakschik, S.; Mikolajick, T.; Schlott, F.; Dubnack, K.; Kreisel, G.: Surface conditioning of the TiO2 electrode in dye-sensitized solar cells. In: Proceedings of the 26th European Photovoltaic Solar Energy Conference, Hamburg (2011)Geidel, M.; Knaut, M.; Albert, M.; Bartha, J.W.: In situ XPS Investigation of the Chemical Surface Composition during the ALD of ultra-thin Aluminum Oxide Films. In: IEEE 2011 Semiconductor Conference Dresden, September 27 to 28, 2011, Dresden (2011)Albert, M.; Strobel, C.; Leszczynska, B.; Zimmermann, T.; Kuske, J.; Bartha, J.W.: Dynamic VHF-PECVD Deposition with Linear Plasma Sources for Amorphous and Microcrystalline Silicon Solar Cells. In: Society of Vacuum Coaters(SVC), Technical Conference Proceedings, Chicago 2011 (2011)Benner, F.; Tarasova, M.; Moll, P.; Jakschik, S.; Dirnstorfer, I.; Knaut, M.; Mikolajick, T.: RF-Magnetron Sputtered Dielectric Backside Passivation. In: Proceedings of the 26th European Photovoltaic Solar Energy Conference, Hamburg (2011)Knaut, M.; Albert, M.; Bartha, J.W.: In-situ analytics for development and control of atomic layer deposition processes. In: 11th European Advanced Equipment Control/Advanced Process Control (AEC/APC) Conference (2011)Knaut, M.; Albert, M.; Bartha, J.W.: QCM sensors for advanced process development and control. In: Proceedings of 11th AVS ALD Conference, Cambridge, Massachusetts, USA (2011)Henke, T.; Geidel, M.; Knaut, M.; Albert, M.; Bartha, J.W.: Flash Light Induced Atomic Layer Deposition. In: Subtherm 2011 – International Topical Workshop on Subsecond Thermal Processing of Advanced Materials, October 25 – 27, 2011, Dresden (2011)Henke, T.; Geidel, M.; Knaut, M.; Albert, M.; Bartha, J.W.: Flash-ALD - A Novel Approach for Atomic Layer Controlled Growth of Thin Films Induced by Flash Heating. In: Proceedings of AVS 11th International Conference on Atomic Layer Deposition, June 26 – 29, 2011, Cambridge, Massachusetts, USA (2011)Wojcik, H.; Lehninger, D.; Neumann, V.; Bartha, J.W.: Characterization of barrier and seed layer integrity for copper interconnects. In: Semiconductor Conference Dresden (SCD), 27-28 Sept. 2011 (2011)Neumann, V.; Hiess, A.; Jahn, A.; Merkel, U.; Richter, K.; Viehweger, K.; Wenzel, C.; Bartha, J.W.: A Through Silicon Via concept for sensor applications. In: Semiconductor Conference Dresden (SCD), 27-28 Sept. 2011 (2011)Zurück 5 6 7 8 9 10 11 12 13 14 WeiterDiese Informationen werden vom Vorgängersystem FIS bereitgestellt.