Publikationen der Professur für Halbleitertech­nik

11 bis 20 von 284 Einträgen

Junige, M.; Kitzmann, J.; Chavarin, C.A.; Geidel, M.; Reif, J.; Albert, M.; Lupina, G.; Wenger, C.; Bartha, J.W.: In-situ real-time and in-vacuo study of the temperature impact on the Al2O3 ALD nucleation upon pristine monolayer graphene. In: AVS 17th International Conference on Atomic Layer Deposition : July 15 – 18, 2017, Denver, Colorado, USA. Denver, 2017 (2017)

Junige, M.; Kitzmann, J.; Geidel, M.; Lupina, G.; Albert, M.; Wenger, C.; Bartha, J.W.: Al2O3 ALD on pristine graphene. In: DPG-Frühjahrstagung der Sektion Kondensierte Materie. Dresden, 2017 Vortrag (2017)

Junige, M.; Löffler, M.; Geidel, M.; Albert, M.; Bartha, J.W.; Zschech, E.; Rellinghaus, B.; van Dorp, W.F.: Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2 substratum. In: Nanotechnology 28 (2017), Nr. 39 (2017), S. 395301

Henke, T.; Knaut, M.; Geidel, M.; Winkler, F.; Albert, M.; Bartha, J.W.: Atomic layer deposition of tantalum oxide thin films using the precursor tert-butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film properties. In: Thin Solid Films 627 (2017), S. 94–105

Patommel, J.; Klare, S.; Hoppe, R.; Ritter, S.; Samberg, D.; Wittwer, F.; Jahn, A.; Richter, K.; Wenzel, C.; Bartha, J.W.; Scholz, M.; Seiboth, F.; Boesenberg, U.; Falkenberg, G.; Schroer, C.G.: Focusing hard x rays beyond the critical angle of total reflection by adiabatically focusing lenses. In: Appl. Phys. Lett. 110, 101103 (2017)

Schwille, M.; Barth, J.; Schössler, T.; Schön, F.; Bartha, J.W.; Oettel, M.: Simulation approach of Atomic Layer Deposition in large 3D structures. In: Modelling and Simulation in Materials Science and Engineering (2017)

Neumann, N.; Charania, S.; Killge, S.; al-Husseini, Z.; Henker, R.; Ellinger, F.; Bartha, J.W.; Plettemeier, D.: Modeling and characterization of optical TSVs . In: SPIE 10325, Optical Fibers and Their Applications 2017, 103250O, Optical Fibers and Their Applications 2017, Supraśl, Poland, Poland | January 23, 2017 (2017)

Schwille, C.; Schössler, T.; Schön, F.; Oettel, M.; Bartha, J.W.: Temperature dependence of the sticking coefficients of bis-diethyl aminosilane and trimethylaluminum in atomic layer deposition. In: J. Vac. Sci. Technol. A 35 , 01B119 (2017)

Schwille, M. C.; Schössler, T.; Barth, J.; Knaut, M.; Schön, F.; Höchst, A.; Oettel, M.; Bartha, J.W.: Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures . In: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35, 01B118 (2017)

Henke, T.; Knaut, M.; Hossbach, C.; Geidel, M.; Albert, M.; Bartha, J.W.: Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition . In: Surface & Coatings Technology 309 (2017), S. 600–608

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Martin Knaut
Letzte Änderung: 05.10.2022