Publications 2010

11 bis 20 von 32 Einträgen

Rose, M.; Niinistö, J.; Endler, I.; Bartha, J.W.; Kücher, P.; Ritala, M.: In Situ Reaction Mechanism Studies on Ozone-Based Atomic Layer Deposition of Al2O3 and HfO2. In: Applied Materials & Interfaces 256 (2010), Nr. 2, S. 347–350

Rose, M.; Bartha, J.W.; Endler, I.: Temperature dependence of the sticking coefficient in atomic layer deposition. In: Applied Surface Science 256 (2010), S. 3778–3782

Neuner, J.; Zienert, I.; Peeva, A.; Preusse, A.; Kücher, P.; Bartha, J.W.: Microstructure in copper interconnects - Influence of plating additive concentration. In: Microelectronic Engineering 87 (2010), S. 254–257

Knaut, M.; Geidel, M.; Krause, M.; Albert, M.; Bartha, J.W.: Ultra-thin AlxTi1-xOy films deposited by atomic layer deposition for DRAM capacitors and quantum devices. In: Proceeding of Nanofair Conference 2010, Dresden, Germany (2010)

Junige, M.; Knaut, M.; Geidel, M.; Albert, M.; Bartha, J.W.: In-situ characterization of ruthenium and ruthenium dioxide film growth. In: Proceeding of Baltic ALD / GerALD Conference 2010, Hamburg, Germany (2010)

Knaut, M.; Geidel, M.; Junige, M.; Krause, M.; Albert, M.; Bartha, J.W.: In-situ analysis of ultra thin ALD capacitor stacks for novel applications. In: Proceeding of AVS ALD Conference 2010, Seoul, Korea (2010)

Zimmermann, T.; Strobel, C.; Albert, M.; Beyer, W.; Gordijn, A.; Flikweert, A.J.; Kuske, J.; Bartha, J.W.: Inline deposition of microcrystalline silicon solar cells using a linear plasma source. In: Phys. Status Solidi C 7 (2010), Nr. 3-4, S. 1097–1100

Schmidt, D.; Knaut, M.; Hossbach, C.; Albert, M.; Hintze, B.; Dussarrat, C.; Bartha, J.W.: Atomic Layer Deposition of Ta-N-Based Thin Films Using a Tantalum Source. In: Journal of The Electrochemical Society 157 (2010), S. 638–642

Roessler, T.; Gluch, J.; Albert, M.; Bartha, J.W.: Electrical characterisation of HfYO MIM-structures deposited by ALD. In: Thin Solid Films 518 (2010), S. 4680–4683

Bartha, J.W.; Borst, C. L.; DeNardis, D.; Papa Rao , S. S.; Kim, H.; Naeemi, A.; Nelson, A.; Wook Ro, H.; Toma, D.: Advanced Interconnects and Chemical Mechanical Planarization for Micro- and Nanoelectronics : Materials Research Sciety, Symposium Proceedings Volume 1249 (2010). - ISBN 978-1-60511-226-8

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Dr. Steffen Strehle
Last modified: Aug 09, 2016