Publications 2012

11 bis 20 von 25 Einträgen

Thrun, X.; Choj, K.-H.; Freitag, M.; Grenville, A.; Gutsch, M.; Hohle, C.; Stowers, J. K.; Bartha, J. W.: Evaluation of direct patternable inorganic spin-on hard mask materials using electron beam lithography. In: Microelectronic engineering 98 98 (2012), S. 226–229

Leszczynska, B.; Strobel, C.; Leszczynski, S.; Albert, M.; Bartha, J.W.; Stephan, U.; Kuske, J.: High-rate deposition of silicon thin film layers using linear plasma sources operated at very high excitation frequencies (80-140 MHz). In: Proceedings of SPIE Optics + Photonics Conference, Thin Film Solar Technology IV, vol. 8470 (2012) (2012)

Künzelmann, K.; Müller, M. R.; Kallis, K.; Schütte, F.; Menzel, S.; Engels, S.; Fong, J.; Lin, C.; Dysard, J.; Bartha, J. W.; Knoch, J.: Chemical-Mechanical Planarization of Aluminium Damascene Structures. In: ICPT 2012 International Conference on Planarization/CMP Technology, Grenoble, France, October 15-17 (2012)

Ernst, D.; Schumann, F.; Nobis, C.; Zerna, T.; Wolter, K.-J.: Mikrokontaktierverfahren auf flexiblen Verdrahtungsträgern. In: Deutsche IMAPS-Konferenz, 11.-12. Oktober 2012, München (2012)

Singh, A.; Hossbach, C.; Hodson, C.; Fang, Qi; Schröder, U.; Mikolajick, T.: Low temperature HfO2 and Al2O3 single layer and multilayer structures. In: 12th International Conference on Atomic Layer Deposition AVS-ALD & Baltic ALD 2012: June 18 – 20, 2012, Dresden (2012)

Hossbach, C.; Drees, M.; Seiffert, D.; Strehle, S.; Junige, M.; Albert, M.; Bartha, J.W.: The Initial Growth of Tantalum Nitride ALD: A Comparative Quantum Chemical and In Situ Experimental Study. In: 12th International Conference on Atomic Layer Deposition AVS-ALD & Baltic ALD 2012: June 18 – 20, 2012, Dresden (2012)

Kubasch, C.: Detection of Water in Low-k Dielectric Film. In: EUFANET, Smart Failure Analysis for New Materials in Electronic Devices, 17.-18. September 2012, Dresden Vortrag (2012)

Geidel, M.; Junige, M.; Albert, M.; Bartha, J.W.: In-situ analysis on the initial growth of ultra-thin ruthenium films with atomic layer deposition. In: Microelectronic Engineering (2012)

Leszczynska, B.; Strobel, C.; Albert, M.; Bartha, J.W.; Kuske, J.: High Rate PECVD Deposition of Silicon Thin Films at Very High Excitation Frequencies (81.36-140 MHz). In: Proceedings of 27th European Photovoltaic Solar Energy Conference and Exhibition 2012 (2012), S. 2507–2510

Junige, M.; Albert, M.; Bartha, J.W.: Opportunities and challenges of ellipsometry for process monitoring in atomic layer deposition. In: 7th Workshop Ellipsometry : March 05-07, 2012 Leipzig, Germany. Leipzig, 2012 Vortrag und Poster (2012)

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Dr. Steffen Strehle
Last modified: Aug 09, 2016