Veröffentlichungen Halbleitertechnik 2014 11 bis 20 von 20 EinträgenJunige, M.; Sharma, V.; Schmidt, D.; Albert, M.; Schubert, M.; Bartha, J. W.: Progress in Spectroscopic Ellipsometry for the in-situ real-time investigation of Atomic Layer Depositions. In: 8th Workshop Ellipsometry, Arbeitskreis Paul Drude e. V. in Dresden, 10.-12.03.2014 Vortrag (2014)Müller, M. R.; Künzelmann, U.; Menzel, S.; Petrov, I.; Kallis, K.; Knoch, J.: Tackling Hillocks Growth after Aluminum CMP. In: ICPT 2014 International Conference on Planarization /CMP Technology, Kobe, Japan, November 19-21, 2014 (2014)Müller, M. R.; Gumprich, A.; Schütte, F.; Kallis, K.; Künzelmann, U.; Engels, S.; Engels, S.; Stampfer, C.; Wilck, N.; Knoch, J.: Buried Triple-Gate Structures for Advanced Field-Effect Transistor Devices. In: Microelectronic Engineering 119 (2014), S. 95–99Junige, M.; Wenger, C.; Darakchieva, V.; Oddoy, T.; Lupina, G.; Albert, M.; Bartha, J. W.: Atomic Layer Depositions on Graphene - An investigation by joint in-situ real-time Spectroscopic Ellipsometry and direct surface analysis. In: 1st Turkish-German Workshop for Graphene-based electronic devices in Elazığ, Turkey, 20.-23.05.2014 Vortrag (2014)Junige, M.; Walther, T. F.; Tanner, R.; Albert, M.; Bartha, J. W.: Growth kinetics and film properties of tantalum nitride ALD investigated by in-situ real-time ellipsometry and in-vacuo surface analysis. In: 12th International Baltic ALD conference, At Helsinki, Finland, 12.-13.05.2014 Vortrag (2014)Junige, M.; Tanner, R.; Wenger, C.; Lupina, G.; Albert, M.; Bartha, J. W.: Ta2O5 by thermal-activated ALD. In: Conference: DPG Frühjahrstagung Dresden, 30.03.-04.04.2014 Vortrag (2014)Strobel, C.; Leszczynska, B.; Leszczynski, S-; Merkel, U.; Kuske, J.; Fischer, D. D.; Albert, M.; Holovský, J.; Bartha, J. W.: Static and Dynamic VHF-Deposition of Microcrystalline Silicon at 140 MHz with Rates Up to 2.5 Nm/s. In: 29th European Photovoltaic Solar Energy Conference and Exhibition, Amsterdam (2014), S. 1917–1920Seiboth, F.; Scholz, M.; Patommel, J.; Hoppe, R.; Wittwer, F.; Reinhardt, J.; Seidel, J.; Knaut, M.; Jahn, A.; Richter, K.; Bartha, J. W.; Falkenberg, G.; Schroer, C. G.: Hard x-ray nanofocusing by refractive lenses of constant thickness. In: Appl. Phys. Lett. 105, 131110 (2014) (2014)Henke, T.; Knaut, M.; Hossbach, C.; Geidel, M.; Rebohle, L.; Albert, M.; Skorupa, W.; Bartha, J. W.: Flash-Lamp-Enhanced Atomic Layer Deposition of Thin Films. In: 226th ECS-Meeting, Symposium P1 - Atomic Layer Deposition Applications 10, 5.-9. Oktober 2014, Cancun, Mexiko ECS Transactions 64 (9) (2014), S. 167–189Henke, T.; Bartha, J.W.; Rebohle, R.; Merkel, U.; Hübner, R.; Albert, M.; Skorupa, W.: Formation of regularly arranged large grain silicon islands by using embedded micro mirrors in the flash crystallization of amorphous silicon. In: Journal of Applied Physics 115, 034301 (2014)Zurück 1 2 Diese Informationen werden vom Vorgängersystem FIS bereitgestellt.