Veröffentlichungen Halbleitertechnik 2014 1 bis 10 von 20 EinträgenSingh, A.; Nehm, F.; Müller-Meskamp, L.; Hossbach, C.; Albert, M.; Schroeder, U.; Leo, K.; Mikolajick, T.: OLED compatible water-based nanolaminate encapsulation systems using ozone based starting layer. In: Organic Electronics, October 2014 15 (2015), Nr. 10, S. 2587–2592Knaut, M.; Dirnstorfer, I.; Albert, M.; Romstedt, D.; Bartha, J.W.: In-situ QCM monitoring of ALD in porous materials. In: Baltic ALD 2014, Helsinki, Finland (2014)Vankov, Yu. V.; Serov, V. V.; Ismailova, E. V.; Wenzel, C.: Rasrabotka effektivnoi mikrosystemy dlya diagnostiki v promyshlennosti : Entwicklung eines effektiven Mikrosystems für die industrielle Diagnostik. In: Nadeshnost i besopasnost energetiki No. 3(26), Sept. 2014 (2014), S. 45–47Fischer, D. D.; Leszczynska, B.; Albert, M.; Bartha, J. W.; Stephan, U.; Kuske, J.; Prager, N.; Fahland, M.: Development and Investigation of Thin Film Solar Cells on Flexible Substrates Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition (VHF-PECVD) Technique. In: 29th European Photovoltaic Solar Energy Conference and Exhibition, 3DV.4.24, Amsterdam, Netherlands, 22.09.-26.09.2014 (2014), S. 1929–1932Bott, S.; Vasilev, B.; Rzehak, R.; Bartha, J. W.: Combining Short and Long Scale Effects in Modeling of Chemical-Mechanical Planarization. In: Journal of Chemical Science and Technology Jan. 2014 3 (2014), Nr. 1, S. 18–29Zimmermann, T.; Flikweert, A. J.; Merdzhanova, T.; Woerdenweber, J.; Gordijn, A.; Rau, U.; Stahr, F.; Dybek, K.; Bartha, J. W.: Deposition of intrinsic hydrogenated amorphous silicon for thin-film solar cells – a comparative study for layers grown statically by RF-PECVD and dynamically by VHF-PECVD. In: Progress in Photovoltaics Research and Applications (Impact Factor: 9.7.) 22 (2014), Nr. 2Benner, F.; Jordan, Paul M.; Richter, C.; Simon, Daniel K.; Dirnstorfer, I.; Knaut, M.; Bartha, J. W.; Mikolajick, T.: Atomic layer deposited high-κ nanolaminates for silicon surface passivation . In: Journal of Vacuum Science & Technolgy, B 32 (2014), Nr. 3, S. 03D110–03D110–6Woijcik, H.; Schwiegel, B.; Klaus, C.; Urbansky, N.; Kriz, J.; Hahn, J.; Kubasch, C.; Wenzel, C.; Bartha, J. W.: Cu barrier properties of very thin Ta and TaN films . In: Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2014 IEEE International, 20-23 May 2014, San Jose, CA (2014), S. 167–170Hossbach, C.; Fischer, D.; Schramm, T.; Albert, M.; Bartha, J. W.; Singh, A.; Richter, C.; Schröder, U.; Nehm, F.; Klumbies, H.; Müller-Meskamp, L.: Molecular Layer Deposition of Aluminum and Titanium Alkoxide for the Encapsulation of Flexible OLED Devices . In: Baltic Conference on Atomic Layer Deposition 2014 (BALD 2014), Helsinki, Finland; 05/2014 (2014)Sobottka, A.; Drößler, L.; Hossbach, C.; Abel, B.; Helmstedt, U.: A Flexible Research Reactor for Atomic Layer Deposition with a Sample-Transport Chamber for in Vacuo Analytics . In: American Journal of Nano Research and Application. Special Issue:Advanced Functional Materials 2 (2014), Nr. 6-1, S. 34–38 1 2 WeiterDiese Informationen werden vom Vorgängersystem FIS bereitgestellt.