Published Journals 2009

1 bis 10 von 14 Einträgen

Menzel, S. B.; Thomas, J.; Weißker, U.; Schäffel, F.; Hoßbach, C.; Albert, M.; Hampel, S.; Gemming, T.: Preparation of CNT-Copper Matrix Composite Films. In: Journal of Nanoscience and Nanotechnology 9 (2009), Nr. 10, S. 6096–6103

Richter, K.; Viehweger, K.; He, J.; Bartha, J.W.: Creation of Vias With optimized Profile for 3-D Through Silicon Interconnects (TSV). In: Plasma Process. Polym. 6 (2009), S. 193–197

Keil, K.; Hauptmann, M.; Kretz, J.; Constancias, C.; Pain, L.; Bartha, J.W.: Resolution and total blur: Correlation and focus dependencies in e-beam lithography. In: J. Vac. Sci. Technol. B27 (2009), Nr. 6, S. 2722–2725

Rose, M.; Niinistö, J.; Michalowski, P.; Gerlich, L.; Wilde, L.; Endler, I.; Bartha, J.W.: Atomic Layer Deposition of Titanium Dioxide Thin Films from Cp*Ti(OMe)3. In: J. Phys. Chem. C 2009 113 (2009), S. 21825–21830

Strehle, S.; Wetzig, K.; Bartha, J.W.: Electrical properties of electroplated Cu(Ag) thin films. In: Thin Solid Films 517 (2009), S. 3320–3325

Wenzel, C.; Bartha, J.W.; Bublik, V.T.; Shcherbachev, K.D.; Novodvorsky, O.A.; Gorbatenko, L.S.; Panchenko, V.Ya.; Khramova, O.D.; Cherebilo, Ye.A.: Optical and Structural Characteristics of Ga-doped ZnO Films. In: Semiconductors Vol. 43, Nr. 4 (2009), S. 419–424

Hossbach, C.; Teichert, S.; Thomas, J.; Wilde, L.; Wojcik, H.; Schmidt, D.; Adolphi, B.; Bertram, M.; Muhle, U.; Albert, A. ; Menzel, S.; Hintze, B.; Bartha, J.W.: Properties of Plasma-Enhanced Atomic Layer Depostion-Grown Tantalum Carbonitrade Thin Films. In: J. Electrochem. Soc. 156 (2009), Nr. H852, DOI: 10.1149/1.3205457

Strobel, C.; Zimmermann, T.; Albert, M.; Bartha, J.W.; Kuske, J.: Productivity potential of an inline deposition system for amorphous and microcrysalline silicon solar cells. In: Solar Energy Materials and Solar Cells (2009), S. 1598–1607

Rose, M.; Bartha, J.W.: Method to determine the sticking coefficient of precursor molecules in atomic layer depostion. In: Applied Surface Science 255 (2009), S. 6620–6623

Keil, K.; Hauptmann, M.; Choi, K.-H.; Kretz, J.; Eng, L.M.; Bartha, J.W.: Fast backscattering parameter determination in e-beam lithography with a modified doughnut test. In: Microelectronic Engineering in press (2009)

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Philipp Wenskus
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