Veröffentlichte Journale 2011

1 bis 8 von 8 Einträgen

Kubasch, C.; Schumacher, H.; Ruelke, H.; Mayer, U.; Bartha, J.W.: Fourier Transform Infrared Spectroscopy of Moisturized Low-k Dielectric Materials. In: Electron Devices, IEEE Transactions on 58 (2011), Nr. 9, S. 2888–2894

He, J.; Richter, K.; Bartha, J.W.; Howitz, S.: Fabrication of silicon template with smooth tapered sidewall for nanoimprint lithography. In: J. Vac. Sci. Technol., Seiten 06FC16-1 bis 06FC16-5 B 29(6) (2011)

Bott, S.; Rzehak, R.; Vasilev, B.; Kücher, P.; Bartha, J.W.: A CMP Model Including Global Distribution of Pressure. In: IEEE Transactions on Semiconductor Manufacturing 24 (2011), Nr. 2, S. 304–314

Vasilev, B.; Rzehak, R.; Bott, S.; Kücher, P.; Bartha, J.W.: Greenwood-Williamson Model Combining Pattern-Density and Pattern-Size Effects in CMP. In: IEEE Transactions on Semiconductor Manufacturing 24 (2011), Nr. 2, S. 338–347

Parshina, L.S.; Novodvorsky, O.A.; Panchenko, V.Ya.; Khramova, O.D.; Cherebilo, Ye.A.; Lotin, A.A.; Wenzel, C.; Trumpaicka, N.; Bartha, J.W.: Photoluminescent properties of nitrogen and phosphorus doped ZnO thin films fabricated by pulsed laser deposition method. In: Laser Physics issue 4 21 (2011), Nr. 4, S. 790–795

Wojcik, H.; Merkel, U.; Jahn, A.; Richter, K.; Junige, M.; Klein, C.; Gluch, J.; Albert, M.; Munnik, F.; Wenzel, C.; Bartha, J.W.: Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements. In: Microelectronic Engineering 88 (2011), Nr. 5, S. 641–645

Strehle, S.; Menzel, S.; Wetzig, K.; Bartha, J.W.: Microstructure of electroplated Cu(Ag) alloy thin films. In: Thin Solid Films 519 (2011), Nr. 11, S. 3522–3529

Strehle, S.; Schmidt, D.; Albert, M.; Bartha, J.W.: Growth of the Initial Atomic Layers of Ta-N Films During Atomic Layer Deposition on Silicon-Based Substrates. In: Chemical Vapor Deposition 17 (2011), S. 37–44

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Philipp Wenskus
Letzte Änderung: 22.09.2016