Veröffentlichte Konferenzbeiträge 2012 1 bis 10 von 17 EinträgenShimizu, H.; Woijcik, H.; Shima, K.; Kobayashi, Y.; Momose, T.; Bartha, J. W.; Shimogaki, Y.: Comparative study on ALD/CVD-Co(W) films as a single barrier/liner layer for 22−1x nm generation interconnects . In: Interconnect Technology Conference (IITC), 2012 IEEE International, San Jose, CA, 4-6 June 2012 (2012), S. 1–3Thrun, X.; Choj, K.-H.; Freitag, M.; Grenville, A.; Gutsch, M.; Hohle, C.; Stowers, J. K.; Bartha, J. W.: Demonstration of 22nm SRAM features with patternable hafnium oxide-based resist material using electron-beam lithography. In: Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 832518 (19 March 2012), San Jose, California, USA, February 2012 (2012)He, J.; Howitz, S.; Killge, S.; Richter, K.; Bartha, J. W.: Deformations of soft imprint templates in the nanoimprint lithography. In: Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231B (March 1, 2012), Alternative Lithographic Technologies IV, San Jose, California, February 12, 2012 (2012)Benner, F.; Jordan, Pa. M.; Knaut, M.; Dirnstorfer, D.; Bartha, J.W.; Mikolajick, T.: Investigation of the c-Si/Al2O2 Interface for Silicon Surface Passivation. In: Proc. of the 27th European Photovoltaic Solar Energy Conferencse, Frankfurt (2012), S. 1793–1796Leszczynska, B.; Strobel, C.; Leszczynski, S.; Albert, M.; Bartha, J.W.; Stephan, U.; Kuske, J.: High-rate deposition of silicon thin film layers using linear plasma sources operated at very high excitation frequencies (80-140 MHz). In: Proceedings of SPIE Optics + Photonics Conference, Thin Film Solar Technology IV, vol. 8470 (2012) (2012)Künzelmann, K.; Müller, M. R.; Kallis, K.; Schütte, F.; Menzel, S.; Engels, S.; Fong, J.; Lin, C.; Dysard, J.; Bartha, J. W.; Knoch, J.: Chemical-Mechanical Planarization of Aluminium Damascene Structures. In: ICPT 2012 International Conference on Planarization/CMP Technology, Grenoble, France, October 15-17 (2012)Ernst, D.; Schumann, F.; Nobis, C.; Zerna, T.; Wolter, K.-J.: Mikrokontaktierverfahren auf flexiblen Verdrahtungsträgern. In: Deutsche IMAPS-Konferenz, 11.-12. Oktober 2012, München (2012)Singh, A.; Hossbach, C.; Hodson, C.; Fang, Qi; Schröder, U.; Mikolajick, T.: Low temperature HfO2 and Al2O3 single layer and multilayer structures. In: 12th International Conference on Atomic Layer Deposition AVS-ALD & Baltic ALD 2012: June 18 – 20, 2012, Dresden (2012)Hossbach, C.; Drees, M.; Seiffert, D.; Strehle, S.; Junige, M.; Albert, M.; Bartha, J.W.: The Initial Growth of Tantalum Nitride ALD: A Comparative Quantum Chemical and In Situ Experimental Study. In: 12th International Conference on Atomic Layer Deposition AVS-ALD & Baltic ALD 2012: June 18 – 20, 2012, Dresden (2012)Kubasch, C.: Detection of Water in Low-k Dielectric Film. In: EUFANET, Smart Failure Analysis for New Materials in Electronic Devices, 17.-18. September 2012, Dresden Vortrag (2012) 1 2 WeiterDiese Informationen werden vom Vorgängersystem FIS bereitgestellt.