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Investigation of Physical and Chemical Interaction during Etching of Silicon in dual Frequency capacitively coupled HBr/NF3 Gas Discharges
Art der Abschlussarbeit
Dissertation
Autoren
- Reinicke, Marco
Betreuer
- Prof. Dr. rer. nat. Johann Wolfgang Bartha
Schlagwörter
Gas Discharge, Silicon Etch,
Berichtsjahr
2009