Physical vapour deposition PVD
Physical vapor deposition procedures enable depositions of excellent tribological and functional films with thicknesses of some few nanometers up to some 10 micrometers. Here they use high-rate evaporation or highly activated plasma procedures and their combination. A special focus, here, is the use of arc discharge as the most effective source of high-energy vapor beam. Basing on these technologies we offer:
- Sample coating
- Film characterization
- Customized modifications of coating systems
- Development of coating systems
- Feasibility studies and
- Economic analysis
- Development and production of adjusted equipment