Dr. Marko Swoboda
Table of contents
© Dr. Marko Swoboda
Research Associate
NameDr. Marko Swoboda
Project Hy²Cycle
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Institute of Process Engineering and Enviromental Technology - Chair of Hydrogen and Nuclear Energy
Institute of Process Engineering and Enviromental Technology - Chair of Hydrogen and Nuclear Energy
Visiting address:
Walther-Pauer-Bau, PAU 218 George-Bähr-Straße 3 b
01069 Dresden
Main areas of activity
ELECSO - Pulsed-Laser Deposition
Scientific biography
| Since 02/2026 | Research Associate at the Chair of Hydrogen and Nuclear Energy, Institute of Power Engineering, TU Dresden |
| 04/2023 - 12/2025 | Senior patent and development engineer OQmented GmbH Itzehoe/Jena |
| 07/2021 - 03/2023 | IP Manager - CTF Solar GmbH Dresden |
| 03/2015 - 06/2021 | Senior Expert Laser/ Senior Staff Engineer - Siltectra GmbH/Infineon AG - Dresden |
| 02/2011 - 01/2015 | Research Associate/Postdoc - B CUBE - TU Dresden |
| 04/2010 - 01/2011 | Patent Attorney Candidate - PMP Patent - Dresden |
| 04/2006 - 03/2010 | Doctoral student - Attosecond Laser Physics - Lunds Universitet - Sweden |
| 10/2000-12/2005 | Physics (Diploma), topic "Time-Resolved Laser Emission from Organic Microcavities" with Prof. Dr. Karl Leo - Institute of Applied Photophysics, TU Dresden |
Publications
2023
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Method of Forming a Semiconductor Device Including an Absorption Layer, 23 Mar 2023, IPC (International Patent Classification) H01L 29/ 06 A I, United States Patent and Trademark Office (PTO), Patent No. US2023092013, 16 Sep 2022, Priority date 23 Sep 2021, Priority No. DE202110124636Research output: Intellectual Property > Patent application/Patent
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Method for splitting semiconductor wafers, 5 Jan 2023, IPC (International Patent Classification) H01L 29/ 16 A I, United States Patent and Trademark Office (PTO), Patent No. US2023005794, 9 Dec 2020, Priority date 9 Dec 2020, Priority No. US202017781585Research output: Intellectual Property > Patent application/Patent
2022
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Verfahren zum Aufteilung eines Halbleiterwerkstücks, 2 Nov 2022, IPC (International Patent Classification) H01L 21/ 78 A I, European Patent Office (EPO), Patent No. EP4084054, 22 Apr 2022, Priority date 10 Mar 2022, Priority No. US202217691763Research output: Intellectual Property > Patent application/Patent
2021
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Method for separating a solid-state layer from a solid-state material, 30 Sep 2021, IPC (International Patent Classification) B28D 5/ 00 A I, United States Patent and Trademark Office (PTO), Patent No. US2021299910, 9 Jun 2021, Priority date 9 Jun 2021, Priority No. US202117343219Research output: Intellectual Property > Patent application/Patent
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Method for Thinning Solid-Body Layers Provided with Components, 22 Jul 2021, IPC (International Patent Classification) H01L 29/ 16 A I, United States Patent and Trademark Office (PTO), Patent No. US2021225709, 14 Sep 2018, Priority date 14 Sep 2018, Priority No. WO2018EP74893Research output: Intellectual Property > Patent application/Patent
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Solid Body and Multi-Component Arrangement, 22 Jul 2021, IPC (International Patent Classification) H01L 21/ 324 A I, United States Patent and Trademark Office (PTO), Patent No. US2021225659, 22 Mar 2021, Priority date 22 Mar 2021, Priority No. US202117207894Research output: Intellectual Property > Patent application/Patent
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Method for forming a crack in an edge region of a donor substrate, 15 Jul 2021, IPC (International Patent Classification) H01L 31/ 18 A I, United States Patent and Trademark Office (PTO), Patent No. US2021213643, 26 Mar 2021, Priority date 26 Mar 2021, Priority No. US202117214256Research output: Intellectual Property > Patent application/Patent
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Method for Reducing the Thickness of Solid-State Layers Provided with Components, 1 Jul 2021, IPC (International Patent Classification) B23K 103/ 00 A N, United States Patent and Trademark Office (PTO), Patent No. US2021197314, 15 Jan 2018, Priority date 15 Jan 2018, Priority No. WO2018EP50902Research output: Intellectual Property > Patent application/Patent
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Methods for processing a semiconductor substrate, 27 May 2021, IPC (International Patent Classification) H01L 21/ 768 A I, United States Patent and Trademark Office (PTO), Patent No. US2021159115, 25 Nov 2020, Priority date 27 Nov 2019, Priority No. DE201910132158Research output: Intellectual Property > Patent application/Patent
2020
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Method for Producing Wafers with Modification Lines of Defined Orientation, 10 Dec 2020, IPC (International Patent Classification) H01L 21/ 78 A I, United States Patent and Trademark Office (PTO), Patent No. US2020388538, 15 Jan 2018, Priority date 15 Jan 2018, Priority No. WO2018EP50897Research output: Intellectual Property > Patent application/Patent