Single-digit height grayscale lithography

Together with colleagues V. A. Guzenko and H. Schift at Paul Scherrer Institute (Switzerland), R. Kirchner (TU Dresden) have published on the latest achievements in reducing the vertical resolution in discrete, multi-level resist patterns to below 6 nm by using electron beam grayscale lithography. This achievement demonstrates the ability for the fabrication of ultra-high precision diffractive optical elements (DOEs) for applications, e.g., in the emerging industrial field of virtual and augmented reality.

The work has been published in Advanced Optical Technologies.

Journal (href: https://doi.org/10.1515/aot-2019-0016) (Open Access)