Robert Kirchner receives EMLC2017 BEST PAPER AWARD

Robert Kirchner received the BEST PAPER AWARD at the European Mask and Lithography Conference 2017 (EMLC2017) for his talk on 172 nm wavelength VUV post-processing of polymer micro-optics high-volume replication. The award ceremony was held at the 25^th Symposium on Photomask and Next Generation Lithography Mask Technology (18.-20.04.2018, Yokohama, Japan). The work is based on a collaborative effort of the Paul Scherrer Institute (Switzerland) as project lead and the TU Dresden (Germany).

https://spie.org/Documents/Membership/BacusNewsletters/BACUS-Newsletter-October-2017.pdf