Dynamic deposition system for amorphous/crystalline silicon heterojunction solar cells

Dynamic deposition system for fabrication of amorphous/crystalline silicon heterojunction solar cells combining linear hot-wire and plasma enhanced chemical vapor deposition methods

Sebastian Leszczynski, Carsten Strobel, Barbara Leszczynska, Sylva Waurenschk, Sören Röhlecke, Frank Stahr, Matthias Albert, Johann W. Bartha

In this work a compatibility of hot-wire chemical vapor deposition and very high frequency linear plasma enhanced chemical vapor deposition in the fabrication process of highly efficient heterojunction solar cells with intrinsic thin-layer was demonstrated by the integration of these techniques into a single in-line system. The individual steps for development of the passivation process were investigated using all compared deposition techniques whereby the same quality of the solar cells was achieved. As a result of our work, we achieved high passivation properties with carrier lifetimes higher than 13 ms as well as highly efficient solar cells with efficiency higher than 22%. The results were reached with very high deposition rates for all presented techniques.