Dr.-Ing. Martin Knaut
Institute of Semiconductor and Mikrosystems Technology (Faculty of Electrical Engineering and Information Technology).
Field of work and research
- Chemical deposition of ultra thin films for semiconductor and microsystem applications by thermal and plasma enhanced Atomic Layer Deposition (ALD)
- Development and characterization of new ALD processes and adaptation of deposition tools and measurement techniques
- In-situ and ex-situ analytics for development and monitoring of ALD processes
- photoelectron spectroscopy (XPS, UPS)
- atomic force microscopy (AFM)
- scanning tunnel microscopy (STM, STS)
- mass spectrometry (QMS)
- quarz crystal microbalance measurements (QCM)
- spectroscopic ellipsometry (SE) - Analysis and characterization of surfaces, interfaces and ultra thin films and film stacks
- Electrical characterization of functional films and structures
- Network administrator at the Institute of Semiconductor and Microsystems Technology
- Administrator and editor-in-chief of the IHM website
- Radiation Protection Officer at the Institute of Semiconductor and Microsystems Technology
- Founding member ALD Lab Saxony
Contact
- email: Martin.Knaut(at)tu-dresden.de
- phone (office): +49 (0) 351 463 33817
- phone (lab): +49 (0) 351 463 34382
- fax: +49 (0) 351 463 37172
- office: Mierdel-Bau (room 104), Noethnitzer Str. 64