Publikationen der Professur für Halbleitertech­nik

71 bis 80 von 284 Einträgen

Bott, S.; Vasilev, B.; Rzehak, R.; Bartha, J. W.: Combining Short and Long Scale Effects in Modeling of Chemical-Mechanical Planarization. In: Journal of Chemical Science and Technology Jan. 2014 3 (2014), Nr. 1, S. 18–29

Zimmermann, T.; Flikweert, A. J.; Merdzhanova, T.; Woerdenweber, J.; Gordijn, A.; Rau, U.; Stahr, F.; Dybek, K.; Bartha, J. W.: Deposition of intrinsic hydrogenated amorphous silicon for thin-film solar cells – a comparative study for layers grown statically by RF-PECVD and dynamically by VHF-PECVD. In: Progress in Photovoltaics Research and Applications (Impact Factor: 9.7.) 22 (2014), Nr. 2

Benner, F.; Jordan, Paul M.; Richter, C.; Simon, Daniel K.; Dirnstorfer, I.; Knaut, M.; Bartha, J. W.; Mikolajick, T.: Atomic layer deposited high-κ nanolaminates for silicon surface passivation . In: Journal of Vacuum Science & Technolgy, B 32 (2014), Nr. 3, S. 03D110–03D110–6

Woijcik, H.; Schwiegel, B.; Klaus, C.; Urbansky, N.; Kriz, J.; Hahn, J.; Kubasch, C.; Wenzel, C.; Bartha, J. W.: Cu barrier properties of very thin Ta and TaN films . In: Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2014 IEEE International, 20-23 May 2014, San Jose, CA (2014), S. 167–170

Hossbach, C.; Fischer, D.; Schramm, T.; Albert, M.; Bartha, J. W.; Singh, A.; Richter, C.; Schröder, U.; Nehm, F.; Klumbies, H.; Müller-Meskamp, L.: Molecular Layer Deposition of Aluminum and Titanium Alkoxide for the Encapsulation of Flexible OLED Devices . In: Baltic Conference on Atomic Layer Deposition 2014 (BALD 2014), Helsinki, Finland; 05/2014 (2014)

Sobottka, A.; Drößler, L.; Hossbach, C.; Abel, B.; Helmstedt, U.: A Flexible Research Reactor for Atomic Layer Deposition with a Sample-Transport Chamber for in Vacuo Analytics . In: American Journal of Nano Research and Application. Special Issue:Advanced Functional Materials 2 (2014), Nr. 6-1, S. 34–38

Junige, M.; Sharma, V.; Schmidt, D.; Albert, M.; Schubert, M.; Bartha, J. W.: Progress in Spectroscopic Ellipsometry for the in-situ real-time investigation of Atomic Layer Depositions. In: 8th Workshop Ellipsometry, Arbeitskreis Paul Drude e. V. in Dresden, 10.-12.03.2014 Vortrag (2014)

Müller, M. R.; Künzelmann, U.; Menzel, S.; Petrov, I.; Kallis, K.; Knoch, J.: Tackling Hillocks Growth after Aluminum CMP. In: ICPT 2014 International Conference on Planarization /CMP Technology, Kobe, Japan, November 19-21, 2014 (2014)

Müller, M. R.; Gumprich, A.; Schütte, F.; Kallis, K.; Künzelmann, U.; Engels, S.; Engels, S.; Stampfer, C.; Wilck, N.; Knoch, J.: Buried Triple-Gate Structures for Advanced Field-Effect Transistor Devices. In: Microelectronic Engineering 119 (2014), S. 95–99

Junige, M.; Wenger, C.; Darakchieva, V.; Oddoy, T.; Lupina, G.; Albert, M.; Bartha, J. W.: Atomic Layer Depositions on Graphene - An investigation by joint in-situ real-time Spectroscopic Ellipsometry and direct surface analysis. In: 1st Turkish-German Workshop for Graphene-based electronic devices in Elazığ, Turkey, 20.-23.05.2014 Vortrag (2014)

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Martin Knaut
Letzte Änderung: 05.10.2022