Veröffentlichungen Halbleitertechnik 2009 1 bis 10 von 24 EinträgenMenzel, S. B.; Thomas, J.; Weißker, U.; Schäffel, F.; Hoßbach, C.; Albert, M.; Hampel, S.; Gemming, T.: Preparation of CNT-Copper Matrix Composite Films. In: Journal of Nanoscience and Nanotechnology 9 (2009), Nr. 10, S. 6096–6103Parshina, L.S.; Novodvorsky, O.A.; Panchenko, V.Ya.; Khramova, O.D.; Cherebilo, Ye.A.; Lotin, A.A.; Wenzel, C.; Trumpaicka, N.; Bartha, J.W.: Electric properties of heterogeneous transitions between n - and p - type ZnO films and n - and p - type silicon substrates. In: Book of abstract of the 17th International Conference on Advanced Laser Technologies, Antalya, Turkey, September 26- October 01 (2009), S. 162Khramova, O.D.; Novodvorsky, O.A.; Panchenko, V.Ya.; Sokolov, V.I.; Parshina, L.S.; Cherebilo, Ye.A.; Lotin, A.A.; Khaydukov, E.V.; Rocheva, V.V.; Wenzel, C.; Bartha, J.W.: The influence of annealing on characteristics ZnO:N films. In: Book of abstract of the 17th International Conference on Advanced Laser Technologies, Antalya, Turkey, September 26- October 01 (2009), S. 69Cherebilo, Ye.A.; Parshina, L.S.; Novodvorsky, O.A.; Panchenko, V.Ya.; Khaydukov, E.V.; Khramova, O.D.; Wenzel, C.; Trumpaicka, n; Bartha, J.W.: Creation of ohmic contacts on n - and p type ZnO films by PLD method. In: Book of abstract of the 17th International Conference on Advanced Laser Technologies, Antalya, Turkey, September 26- October 01 (2009), S. 220Richter, K.; Viehweger, K.; He, J.; Bartha, J.W.: Creation of Vias With optimized Profile for 3-D Through Silicon Interconnects (TSV). In: Plasma Process. Polym. 6 (2009), S. 193–197Keil, K.; Hauptmann, M.; Kretz, J.; Constancias, C.; Pain, L.; Bartha, J.W.: Resolution and total blur: Correlation and focus dependencies in e-beam lithography. In: J. Vac. Sci. Technol. B27 (2009), Nr. 6, S. 2722–2725Rose, M.; Niinistö, J.; Michalowski, P.; Gerlich, L.; Wilde, L.; Endler, I.; Bartha, J.W.: Atomic Layer Deposition of Titanium Dioxide Thin Films from Cp*Ti(OMe)3. In: J. Phys. Chem. C 2009 113 (2009), S. 21825–21830Strehle, S.; Wetzig, K.; Bartha, J.W.: Electrical properties of electroplated Cu(Ag) thin films. In: Thin Solid Films 517 (2009), S. 3320–3325Künzelmann, U.: Herstellung und Anwendung von mikrostrukturierten Siliciumwafern als Reflexionselemente für die Untersuchung chemisch-physikalischer Oberflächenprozesse mittels ATR-FTIR-Spektroskopie. In: 14. AKES-Seminar, 06.02.2009 (2009)Künzelmann, U.; Schumacher, H.; Bartha, J.W.: Investigation of Surface Processes by ATR-FTIR Spectroscopy at Microstructured Silicon Wafers. In: 23rd CMP User Meeting, 09.10.2009 (2009) 1 2 3 WeiterDiese Informationen werden vom Vorgängersystem FIS bereitgestellt.