Veröffentlichte Journale 51 bis 60 von 107 EinträgenGeidel, M.; Junige, M.; Albert, M.; Bartha, J.W.: In-situ analysis on the initial growth of ultra-thin ruthenium films with atomic layer deposition. In: Microelectronic Engineering (2012)Kubasch, C.; Schumacher, H.; Ruelke, H.; Mayer, U.; Bartha, J.W.: Fourier Transform Infrared Spectroscopy of Moisturized Low-k Dielectric Materials. In: Electron Devices, IEEE Transactions on 58 (2011), Nr. 9, S. 2888–2894He, J.; Richter, K.; Bartha, J.W.; Howitz, S.: Fabrication of silicon template with smooth tapered sidewall for nanoimprint lithography. In: J. Vac. Sci. Technol., Seiten 06FC16-1 bis 06FC16-5 B 29(6) (2011)Bott, S.; Rzehak, R.; Vasilev, B.; Kücher, P.; Bartha, J.W.: A CMP Model Including Global Distribution of Pressure. In: IEEE Transactions on Semiconductor Manufacturing 24 (2011), Nr. 2, S. 304–314Vasilev, B.; Rzehak, R.; Bott, S.; Kücher, P.; Bartha, J.W.: Greenwood-Williamson Model Combining Pattern-Density and Pattern-Size Effects in CMP. In: IEEE Transactions on Semiconductor Manufacturing 24 (2011), Nr. 2, S. 338–347Parshina, L.S.; Novodvorsky, O.A.; Panchenko, V.Ya.; Khramova, O.D.; Cherebilo, Ye.A.; Lotin, A.A.; Wenzel, C.; Trumpaicka, N.; Bartha, J.W.: Photoluminescent properties of nitrogen and phosphorus doped ZnO thin films fabricated by pulsed laser deposition method. In: Laser Physics issue 4 21 (2011), Nr. 4, S. 790–795Wojcik, H.; Merkel, U.; Jahn, A.; Richter, K.; Junige, M.; Klein, C.; Gluch, J.; Albert, M.; Munnik, F.; Wenzel, C.; Bartha, J.W.: Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements. In: Microelectronic Engineering 88 (2011), Nr. 5, S. 641–645Strehle, S.; Menzel, S.; Wetzig, K.; Bartha, J.W.: Microstructure of electroplated Cu(Ag) alloy thin films. In: Thin Solid Films 519 (2011), Nr. 11, S. 3522–3529Strehle, S.; Schmidt, D.; Albert, M.; Bartha, J.W.: Growth of the Initial Atomic Layers of Ta-N Films During Atomic Layer Deposition on Silicon-Based Substrates. In: Chemical Vapor Deposition 17 (2011), S. 37–44Lotin, A.A.; Novodvorsky, O.A.; Khaydukov, E.V.; Glebov, V.N.; Rocheva, V.V.; Khramova, O.D.; Panchenko, V.Ya.; Wenzel, C.; Trumpaicka, N.; Chtcherbachev, K.D.: Epitaxial growth and properties of MgxZn1-xO films produced by pulsed laser deposition. In: Semiconductors 44 (2010), Nr. 2, S. 246–250Zurück 2 3 4 5 6 7 8 9 10 11 WeiterDiese Informationen werden vom Vorgängersystem FIS bereitgestellt. Journal Archiv: 2015 | 2014 | 2013 | 2012 | 2011 | 2010 | 2009 | 2008 | 2007 | 2006 | 2005