Veröffentlichte Journale 2015

1 bis 10 von 12 Einträgen

Nehm, F.; Klumbies, H.; Richter, C.; Singh, A.; Schroeder, U.; Mikolajick, T.; Mönch, T.; Hossbach, C.; Albert, M.; Bartha, J.W.; Leo, K.; Müller-Meskamp, L.: Breakdown and Protection of ALD Moisture Barrier Thin Films. In: ACS Appl. Mater. Interfaces, 2015, 7 (40) (2015), S. 22121–22127

Thrun, X.; Browning, C.; Choi, K.-H.; Figueiro, T.; Hohle, C.; Saib, M.; Schlavone, P.; Bartha, J.W.: Sensitivity analysis for high accuracy proximity effect correction . In: Proc. SPIE 9635, Photomask Technology 2015, 963515 (October 23, 2015) (2015)

Strobel, C.; Leszczynska, B.; Merkel, U.; Kuske, J.; Fischer, D.D.; Albert, M.; Holovský, J.; Michard, S.; Bartha, J.W.: High efficiency high rate microcrystalline silicon thin-film solar cells deposited at plasma excitation frequencies larger than 100 MHz. In: Sol. Energy Mater. Sol. Cells 143 (2015), S. 347–353

Hauke, A.; Hossbach, C.; Sawatzki, M.; Kasemann, D.; Bartha, J.W.; Leo, K.: Controlling threshold voltage and leakage currents in vertical organic field-effect transistors by inversion mode operation . In: Applied Physics Letters > Volume 107, Issue 23 (2015)

Simon, D. K.; Henke, T.; Jordan, P. M.; Fengler, F. P. G.; Mikolajick, T.; Bartha, J.W.; Dirnstorfer, I.: Low-thermal budget flash light annealing for Al2O3 surface passivation. In: Physica Status Solidi (RRL) – Rapid Research Letters 9 (2015), Nr. 11, S. 631–635

Henke, T.; Knaut, M.; Hoßbach, C.; Geidel, M.; Rebohle, L.; Albert, M.; Skorupa, W.; Bartha, J.W.: Flash-Enhanced Atomic Layer Deposition: Basics, Opportunities, Review, and Principal Studies on the Flash-Enhanced Growth of Thin Films. In: ECS Journal of Solid State Science and Technology 4 (2015), Nr. 7, S. 277–287

Abidin, A.Z.; Kozera, R.; Höhn, M.; Endler, I.; Knaut, M.; Boczkowska, A.; Czulak, A.; Malczyk, P.; Sobczak, N.; Michaelis, A.: Preparation and characterization of CVD-TiN-coated carbon fibers for applications in metal matrix composites. In: Thin Solid Films 589 (2015), S. 479–486

Olawumi, T.; Levrau, E.; Krishtab, M.; Detavernier, C.; Bartha, J. W.; Xu, K.; Lazzarino, F.; Baklanov, M. R.: Modification of Ultra Low-k Dielectric Films by O2 and CO2 Plasmas . In: ECS J. Solid State Sci. Technol. 01/2014 4 (2015), S. N3048–N3057

Kubasch, C.; Ruelke, H.; Mayer, U.; Bartha, J. W.: Leakage Current and Breakthrough Measurements on Moisturized SiCOH. In: ECS J. Solid State Sci. Technol. 2015 4 (2015), Nr. 1, S. N3118–N3121

Kubasch, C.; Olawumi, T.; Ruelke, H.; Mayer, U.; Bartha, J. W.: Investigation of Argon Plasma Damage on Ultra Low-κ Dielectrics. In: ECS J. Solid State Sci. Technol. 2015 4 (2015), Nr. 1, S. N3023–N3028

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Philipp Wenskus
Letzte Änderung: 22.09.2016