Veröffentlichte Journale 11 bis 20 von 107 EinträgenDirnstorfer, I.; Chohan, T.; Jordan, Paul M.; Knaut, M.; Simon, Daniel K.; Bartha, J.W.; Mikolajick, T.: Al2O3-TiO2 Nanolaminates for Conductive Silicon Surface Passivation. In: 86 IEEE JOURNAL OF PHOTOVOLTAICS, VOL. 6, NO. 1, JANUARY 2016 (2016), S. 86–91Zazpe, R.; Knaut, M.; Sopha, H.; Hromadko, L.; Albert, M.; Prikryl, J.; Gärtnerová, V.; Bartha, J.W.; Macak, Jan M.: Atomic Layer Deposition for Coating of High Aspect Ratio TiO2 Nanotube Layers. In: Langmuir, 2016, 32 (41) (2016), S. 10551–10558Lupina, G.; Strobel, C.; Dabrowski, J.; Lippert, G.; Kitzmann, J.; Krause, H.M.; Wenger, C.; Lukosius, M.; Wolff, A.; Albert, M.: Plasma-enhanced chemical vapor deposition of amorphous Si on graphene. In: Applied Physics Letters 108, 193105 (2016) (2016)Nehm, F.; Klumbies, H.; Richter, C.; Singh, A.; Schroeder, U.; Mikolajick, T.; Mönch, T.; Hossbach, C.; Albert, M.; Bartha, J.W.; Leo, K.; Müller-Meskamp, L.: Breakdown and Protection of ALD Moisture Barrier Thin Films. In: ACS Appl. Mater. Interfaces, 2015, 7 (40) (2015), S. 22121–22127Thrun, X.; Browning, C.; Choi, K.-H.; Figueiro, T.; Hohle, C.; Saib, M.; Schlavone, P.; Bartha, J.W.: Sensitivity analysis for high accuracy proximity effect correction . In: Proc. SPIE 9635, Photomask Technology 2015, 963515 (October 23, 2015) (2015)Strobel, C.; Leszczynska, B.; Merkel, U.; Kuske, J.; Fischer, D.D.; Albert, M.; Holovský, J.; Michard, S.; Bartha, J.W.: High efficiency high rate microcrystalline silicon thin-film solar cells deposited at plasma excitation frequencies larger than 100 MHz. In: Sol. Energy Mater. Sol. Cells 143 (2015), S. 347–353Hauke, A.; Hossbach, C.; Sawatzki, M.; Kasemann, D.; Bartha, J.W.; Leo, K.: Controlling threshold voltage and leakage currents in vertical organic field-effect transistors by inversion mode operation . In: Applied Physics Letters > Volume 107, Issue 23 (2015)Simon, D. K.; Henke, T.; Jordan, P. M.; Fengler, F. P. G.; Mikolajick, T.; Bartha, J.W.; Dirnstorfer, I.: Low-thermal budget flash light annealing for Al2O3 surface passivation. In: Physica Status Solidi (RRL) – Rapid Research Letters 9 (2015), Nr. 11, S. 631–635Henke, T.; Knaut, M.; Hoßbach, C.; Geidel, M.; Rebohle, L.; Albert, M.; Skorupa, W.; Bartha, J.W.: Flash-Enhanced Atomic Layer Deposition: Basics, Opportunities, Review, and Principal Studies on the Flash-Enhanced Growth of Thin Films. In: ECS Journal of Solid State Science and Technology 4 (2015), Nr. 7, S. 277–287Abidin, A.Z.; Kozera, R.; Höhn, M.; Endler, I.; Knaut, M.; Boczkowska, A.; Czulak, A.; Malczyk, P.; Sobczak, N.; Michaelis, A.: Preparation and characterization of CVD-TiN-coated carbon fibers for applications in metal matrix composites. In: Thin Solid Films 589 (2015), S. 479–486Zurück 1 2 3 4 5 6 7 8 9 10 WeiterDiese Informationen werden vom Vorgängersystem FIS bereitgestellt. Journal Archiv: 2015 | 2014 | 2013 | 2012 | 2011 | 2010 | 2009 | 2008 | 2007 | 2006 | 2005