Published Journals https://tu-dresden.de/ing/elektrotechnik/ihm/hlt/forschung/publikationen-1/journale https://tu-dresden.de/logo.png Published Journals 1 bis 10 von 107 EinträgenStrobel, C.; Chavarin, C.A.; Kitzmann, J.; Lupina, G.; Wenger, C.; Albert, M.; Bartha, J.W.: Towards high frequency heterojunction transistors: Electrical characterization of N-doped amorphous silicon-graphene diodes. In: Journal of Applied Physics 121 (2017)Junige, M.; Löffler, M.; Geidel, M.; Albert, M.; Bartha, J.W.; Zschech, E.; Rellinghaus, B.; van Dorp, W.F.: Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2 substratum. In: Nanotechnology 28 (2017), Nr. 39 (2017), S. 395301Henke, T.; Knaut, M.; Geidel, M.; Winkler, F.; Albert, M.; Bartha, J.W.: Atomic layer deposition of tantalum oxide thin films using the precursor tert-butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film properties. In: Thin Solid Films 627 (2017), S. 94–105Patommel, J.; Klare, S.; Hoppe, R.; Ritter, S.; Samberg, D.; Wittwer, F.; Jahn, A.; Richter, K.; Wenzel, C.; Bartha, J.W.; Scholz, M.; Seiboth, F.; Boesenberg, U.; Falkenberg, G.; Schroer, C.G.: Focusing hard x rays beyond the critical angle of total reflection by adiabatically focusing lenses. In: Appl. Phys. Lett. 110, 101103 (2017)Schwille, M.; Barth, J.; Schössler, T.; Schön, F.; Bartha, J.W.; Oettel, M.: Simulation approach of Atomic Layer Deposition in large 3D structures. In: Modelling and Simulation in Materials Science and Engineering (2017)Schwille, C.; Schössler, T.; Schön, F.; Oettel, M.; Bartha, J.W.: Temperature dependence of the sticking coefficients of bis-diethyl aminosilane and trimethylaluminum in atomic layer deposition. In: J. Vac. Sci. Technol. A 35 , 01B119 (2017)Schwille, M. C.; Schössler, T.; Barth, J.; Knaut, M.; Schön, F.; Höchst, A.; Oettel, M.; Bartha, J.W.: Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures . In: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35, 01B118 (2017)Henke, T.; Knaut, M.; Hossbach, C.; Geidel, M.; Albert, M.; Bartha, J.W.: Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition . In: Surface & Coatings Technology 309 (2017), S. 600–608Al-Shadeedi, A.; Liu, S.; Keum, Chang-Min; Kasemann, D.; Hossbach, C.; Bartha, J.W.; Bunge, Scott D; Lüssem, B.: Minority Currents in n-Doped Organic Transistors. In: ACS Appl. Mater. Interfaces, 2016, 8 (47), pp 32432–32439 (2016)Nehm, F.; Dollinger, F.; Klumbies, H.; Müller-Meskamp, L.; Leo, K.; Singh, A.; Richter, C.; Schroeder, U.; Mikolajick, T.; Hossbach, C.; Albert, M.; Bartha, J.W.: Atomic layer deposited TiOx/AlOx nanolaminates as moisture barriers for organic devices. In: Organic Electronics Volume 38, November 2016 (2016), S. 84–88 1 2 3 4 5 6 7 8 9 10 WeiterDiese Informationen werden vom Vorgängersystem FIS bereitgestellt. Journals Archives: 2015 | 2014 | 2013 | 2012 | 2011 | 2010 | 2009 | 2008 | 2007 | 2006 | 2005