AWEO

Atomic layer deposition (ALD) of bismuth and iron-containing oxide layers (AWEO)

Funded by
EFRE technology funding from the European Union and the Free State of Saxony
Project sponsor
Sächsische Aufbaubank - Förderbank (SAB)
Funding amount
297.000€
Duration
2025-2027
Project number
100765637
Cooperation partner
TechiFab GmbH
Contact person(s)
Dr. Martin Knaut, Arno Pfefferling

The aim of the project is to successfully deposit bismuth and iron oxide layers on wafer level using atomic layer deposition (ALD). To this end, TU Dresden will develop, characterize, and optimize ALD processes for the production of individual layers on large substrates. The subsequent combination of processes for the production of bismuth iron oxide layers will then focus on the precise control of layer growth and layer composition.