ENSARÖSI

Development and optimization of an oxygen plasma resistant X-ray transmission window for silicon drift detector modules (ENSARÖSI)

Funded by
BMWE - Zentrales Innovationsprogramm Mittelstand (ZIM)
Project sponsor
AiF Projekt GmbH
Funding amount
220.000€
Duration
2023-2026
Project number
KK5528301JP3
Cooperation partner
KETEK GmbH
Contact person(s)
Dr. Martin Knaut, Ole Bieg

The aim of this research project is to develop a thin plasma protection layer for KETEK X-ray windows. The plasma protection layer must have good X-ray transparency in the application-relevant energy range and must be able to be applied reproducibly, over the entire surface and without defects. The project aims at a process demonstration for the production of a suitable plasma protection layer, for which the individual sub-areas from the preparation of the manufactured graphene window chips, the selection of the optimal protective layer and the optimal coating process to the process development of the window membrane coating and the system technology for a scalable process are considered. The aim is to transfer the new window to series production at the end of the project and launch it on the market within a few months.