Abschlussarbeiten - Master
Characterization and optimization of AZO coatings deposited by means of reactive magnetron sputtering
Art der Abschlussarbeit
Master
Autoren
- Zeng, Yi
Betreuer
- Prof. Dr. rer. nat. Johann Wolfgang Bartha
- Dr.-Ing Matthias Albert
Weitere Betreuer
Dr. Andreas Panckow (Solayer GmbH)
Abstract
In this work we focused on the investigation of the relationship between the deposition conditions and the electrical, optical and structural properties of AZO (aluminum doped zinc oxide film) thin films. The aim is to develop a process using an aluminum-zinc alloy (Al: 1.5% wt) target by reactive magnetron sputtering to produce a specific type of AZO films. This type of AZO film should have optimal optical and electrical properties for CIGS thin film solar cells. Numerous parameters in the magnetron sputtering process may heavily influence the properties of the deposited AZO films, such as: Al content in the target, substrate temperature, discharge voltage, process pressure, oxygen flow, distance between target and substrate [1]. In this work we mainly investigated the impact of oxygen flow, process pressure, discharge voltage and also hydrogen to the film properties. The sputtering processes with continuous DC as well as pulsed DC plasma excitation have been applied to this work. In addition, a posttreatment technology: FLA (flash lamp annealing) has also been included in this work. Experiments have shown that this is an effective way to improve the properties of thin films.
In the first section of this thesis the deposition aim will be introduced. Subsequently, a brief introduction to the basic background theories is presented. The third section introduces the reactive magnetron sputtering equipment V900. Which is followed by an explanation of the characterization methods for thin films. The last section focuses on optimization of the properties of AZO films by using a variety of deposition recipes. To analyze the results the in-house analytical instruments are available. The sheet resistance, film thickness, transmittance and reflection of the films have been measured. By applying the Drude-model, the charge carrier concentration and mobility can be calculated, which leads to a more detailed explanation of the parameters influences on the film properties.
In the first section of this thesis the deposition aim will be introduced. Subsequently, a brief introduction to the basic background theories is presented. The third section introduces the reactive magnetron sputtering equipment V900. Which is followed by an explanation of the characterization methods for thin films. The last section focuses on optimization of the properties of AZO films by using a variety of deposition recipes. To analyze the results the in-house analytical instruments are available. The sheet resistance, film thickness, transmittance and reflection of the films have been measured. By applying the Drude-model, the charge carrier concentration and mobility can be calculated, which leads to a more detailed explanation of the parameters influences on the film properties.
Schlagwörter
Aluminum doped zinc oxide; reactive magnetron sputtering; process optimization; thin film
Berichtsjahr
2016