Laboratory for Optical Field Measurement

With the Laboratory for Optical Field Measurements the chair is able to use different field measurement techniques at a wide range of experimental tasks. Apart from the usage of pattern-based as well as coherent optical measurement techniques and photoelasticity in research projects, their theoretical principles and practical usage are taught at lectures and practical laboratory courses. For this purpose, proprietary measurement systems, individual experimental setups as well as fundamental technology for image projection and image acquisition are available.

Measurement Systems

• Digital Image Correlation System
  GOM mbH ARAMIS 4M
  Field measurement of three-dimensional distortion of the surface and other deduced quantities
  Spatial Resolution: 2400x1728 Pixel
  Time Resolution: up to 168 Hz (in full spatial resolution)
  Measurement Area: between 15x11 mm² and 270x190 mm²
• Laser-Extensometer
  Fiedler Optoelektronik GmbH P-50
  High-Frequency Single-Axis Measurement of Distortion
  Resolution: 0,1 µm
  Edge Distance: min. 0,5 mm
  Accuracy Class: 0,2
  Measurement Length: 50 mm
  Scanning Rate: 200 Hz
• Digital Speckle Pattern Interferometry
  Conversion on the Basis of an Ettemeyer-Sensor

Optics AND Imaging

• Stereo Microscope
  Olympus SZX16
  Continuous magnification with large working distance and high depth of focus.
  Magnification: 7x - 115x
  Field of View Diameter: 31,4 - 1,9 mm
  Accessories: LED ring light with segment control, digital image acquisition
• Transmission Microscope
  Olympus BX40
  Fluorescence microscopy with optional polarisation
  Magnification: 50x, 100x, 200x, 500x
  Accessories: Transmission and refelection light source, linear polarisation filter set
• Diverse long distance microscopes, entocentric und telecentric measurement lenses and digital image sensors