Publikationen der Professur für Halbleitertech­nik

211 bis 220 von 284 Einträgen

Nobis, C.; Klaus, C.; Hiemann, H.; Wenzel, C.; Bartha, J.W.; Rudolf, F.: Preparation of coated Au and Cu wires for US and investigation on their impact on the US wedge bond process. In: Smart Systems Integration, 10.-11.03.2009, Brüssel Paper (2009)

Rose, M.; Bartha, J.W.: Method to determine the sticking coefficient of precursor molecules in atomic layer depostion. In: Applied Surface Science 255 (2009), S. 6620–6623

Keil, K.; Hauptmann, M.; Choi, K.-H.; Kretz, J.; Eng, L.M.; Bartha, J.W.: Fast backscattering parameter determination in e-beam lithography with a modified doughnut test. In: Microelectronic Engineering in press (2009)

Strehle, S.; Menzel, S.; Jahn, A. ; Merkel, U.; Bartha, J.W.; Wetzig, K.: Electromigration in electroplated Cu(Ag) alloy thin films investigated by means of single damascene Blech structures. In: Microelectronic Engineering in press (2009)

Liske, R.; Wehner, S.; Preusse, A. ; Kuecher, P.; Bartha, J.W.: Influence of Additve Coadsoption on Copper Superfill Behavior. In: J. Electrochem. Soc. 156 (2009), Nr. 12, S. 955–960

Keil, K.; Choi, K.-H.; Hohle, C.; Kretz, J.; Szikszai, L.; Bartha, J.W.: Detailed characterization of hydrogen silsesquixane for e-beam applications in a dynamic random access memory pilot line environment. In: J. Vac. Sci. Technol. B 27(1) (2009), S. 1071–1023

Gorbatenko, L.S.; Novodvorsky, O.A.; Panchenko, V.Ya.; Khramova, O.D.; Cherebilo, Ye.A.; Lotin, A.A.; Wenzel, C.; Trumpaicka, N.; Bartha, J.W.: Characterization of ZnO:Ga and ZnO:N films prepared by PLD. In: Laser Physics Vol. 19, Nr. 5 (2009), S. 1152–1158

Strobel, C.; Schmidt, C.; Zimmermann, T. ; Albert, M.; Bartha, J.W.; Kuske, J.: Amorphous and microcrystalline silicon p-i-in solar cells on flexible polymer substrates deposited by an inline VHF-PECVD deposition system. In: Proc. of the 24th European Photovoltaic Solar Engery Conf., Hamburg 2009 (2009)

Новодворский, O.A.; Горбатенко, Л. С.; Панченко, В. Я.; Храмова, О. Д.; Черебыло, Е. А.; Венцель, К.; Барта, Й. В.; Бублик, В. Т.; Щербачев, К. Д.: Оптические и структурные характеристики пленок оксида цинка, легированных галлием. In: Физика и техника полупроводников, 2009 том 43 (2009), S. 439–444

Knaut, M.; Albert, M.; Bartha, J.W.; Schmidt, D.; Schumacher, H.; Strehle, S.: Effect of wet chemical substrate pretreatment on the growth behavior of Ta(N) films deposited by thermal ALD. In: Microelectronic Engineering 85 (2008), S. 2064–2067

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Martin Knaut
Letzte Änderung: 05.10.2022