Publications

31 bis 40 von 284 Einträgen

Junige, M.; Killge, S.; Reif, J.; Geidel, M.; Albert, M.; Bartha, J.W.: The ALD of Ru and RuO2 – An intertwined special case. In: AVS 16th International Conference on Atomic Layer Deposition : 24th – 27th July 2016, Dublin, Ireland. Dublin, 2016 (2016)

Nehm, F.; Dollinger, F.; Klumbies, H.; Müller-Meskamp, L.; Leo, K.; Singh, A.; Richter, C.; Schroeder, U.; Mikolajick, T.; Hossbach, C.; Albert, M.; Bartha, J.W.: Atomic layer deposited TiOx/AlOx nanolaminates as moisture barriers for organic devices. In: Organic Electronics Volume 38, November 2016 (2016), S. 84–88

Dirnstorfer, I.; Chohan, T.; Jordan, Paul M.; Knaut, M.; Simon, Daniel K.; Bartha, J.W.; Mikolajick, T.: Al2O3-TiO2 Nanolaminates for Conductive Silicon Surface Passivation. In: 86 IEEE JOURNAL OF PHOTOVOLTAICS, VOL. 6, NO. 1, JANUARY 2016 (2016), S. 86–91

Zazpe, R.; Knaut, M.; Sopha, H.; Hromadko, L.; Albert, M.; Prikryl, J.; Gärtnerová, V.; Bartha, J.W.; Macak, Jan M.: Atomic Layer Deposition for Coating of High Aspect Ratio TiO2 Nanotube Layers. In: Langmuir, 2016, 32 (41) (2016), S. 10551–10558

Leszczynska, B.; Strobel, C.; Leszczynski, S.; Fischer, D.D.; Albert, M.; Bartha, J.W.; Stephan, U.; Kuske, J.: Deposition of Amorphous and Microcrystalline Silicon in Very High Frequency Range Up to 140 Mhz. In: 32nd European Photovoltaic Solar Energy Conference and Exhibition (2016) (2016), S. 1272–1275

Lupina, G.; Strobel, C.; Dabrowski, J.; Lippert, G.; Kitzmann, J.; Krause, H.M.; Wenger, C.; Lukosius, M.; Wolff, A.; Albert, M.: Plasma-enhanced chemical vapor deposition of amorphous Si on graphene. In: Applied Physics Letters 108, 193105 (2016) (2016)

Hossbach, C.; Günther, A.; Lüssem, B.; Sawatzki, M.; Henke, T.; Knaut, M.; Kasemann, D.; Shadeedi, A.A.; Albert, M.; Leo, K.; Bartha, J.W.: Organic electronic devices with inorganic high-k gate oxides grown by Atomic Layer Deposition. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

Fischer, D.; Knaut, M.; Albert, M.; Bartha, J.W.: Comparison of MLD-processes with aromatic and linear organic precursor investigated by in situ QCM and in vacuo XPS. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

Schwille, M.; Schön, F.; Knaut, M.; Bartha, J.W.: Experimental and simulative approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

Prikryl, J.; Zazpe, R.; Knaut, M.; Sopha, H.; Bartha, J.W.; Macak, J.: High-aspect ratio anodic TiO2 nanotubes: unprecedented ability of ALD to add a functionality. In: 16th AVS conference on Atomic Layer Deposition, Dublin, Ireland (2016)

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Martin Knaut
Last modified: Oct 05, 2022